Semiconductor device

ABSTRACT

A semiconductor device includes a lower structure; a first upper structure including lower gate layers on the lower structure; a second upper structure including upper gate layers on the first upper structure; separation structures penetrating the first and second upper structures on the lower structure; a memory vertical structure penetrating the lower and upper gate layers between the separation structures; and a first contact plug penetrating the first and second upper structures and spaced apart from the lower and upper gate layers. Each of the first contact plug and the memory vertical structure includes a lateral surface having a bent portion. The bent portion of the lateral surface is disposed between a first height level on which an uppermost gate layer of the lower gate layers is disposed and a second height level on which a lowermost gate layer of the upper gate layers is disposed.

CROSS-REFERENCE TO RELATED APPLICATIONS

This is a Continuation of U.S. application Ser. No. 17/032,128, filedSep. 20, 2020, and a claim of priority is made to Korean PatentApplication No. 10-2020-0037079 filed on Mar. 26, 2020 in the KoreanIntellectual Property Office, the disclosures of which are incorporatedherein by reference in their entireties.

BACKGROUND

Example embodiments of the present disclosure relate to a semiconductordevice, and particularly, to a semiconductor device including a memoryvertical structure and a method of manufacturing the same.

As the demand for high performance, high speed, and/ormultifunctionality of a semiconductor device has increased, integrationdensity of a semiconductor device has been increased. To increaseintegration density of a semiconductor device, a method of disposinggates in a vertical direction has been suggested, rather than disposinggates on a two-dimensional plane.

SUMMARY

An example embodiment of the present disclosure provides a semiconductordevice which may improve integration density.

An example embodiment of the present disclosure provides a semiconductordevice which may improve integration density and may also securereliability.

According to an example embodiment of the present disclosure, asemiconductor device includes: a lower structure; a first upperstructure including lower gate layers on the lower structure; a secondupper structure including upper gate layers on the first upperstructure; separation structures penetrating the first and second upperstructures on the lower structure; a memory vertical structurepenetrating the first and second upper structures and penetrating thelower and upper gate layers between the separation structures; and afirst contact plug penetrating the first and second upper structures andspaced apart from the lower and upper gate layers. The memory verticalstructure includes a lateral surface having at least one bent portion.The first contact plug includes a lateral surface having at least onebent portion. The at least one bent portion of the lateral surface ofthe memory vertical structure and the at least one bent portion of thelateral surface of the first contact plug are disposed between a firstheight level on which an uppermost gate layer of the lower gate layersis disposed and a second height level on which a lowermost gate layer ofthe upper gate layers is disposed.

According to an example embodiment of the present disclosure, asemiconductor device includes: a lower structure including a substrate,a circuit structure including lower pads on the substrate, a lowerinsulating layer covering the circuit structure, and a pattern structureand a first intermediate insulating layer on the lower structure; afirst pad pattern including a first pad portion in the firstintermediate insulating layer and a first via portion extendingdownwardly from the first pad portion and electrically connected to afirst lower pad of the lower pads; a contact pattern including a contactportion overlapping the pattern structure and in contact with thepattern structure, an extension portion extending from the contactportion into an intermediate insulating layer, and a second via portionextending downwardly from the extension portion and electricallyconnected to a second lower pad of the lower pads; lower gate layersstacked in order on the pattern structure and upper gate layers stackedin order on the lower gate layers; a memory vertical structurepenetrating the lower and upper gate layers on the pattern structure;and a first contact plug spaced apart from the lower and upper gatelayers on the first pad pattern. The contact pattern and the pad patternhave upper surfaces coplanar with each other. The contact portion of thecontact pattern has a first thickness. At least a portion of theextension portion and at least a portion of the pad portion has a secondthickness greater than the first thickness.

According to an example embodiment of the present disclosure, asemiconductor device includes: a lower structure; a first upperstructure including lower gate layers on the lower structure; a secondupper structure including upper gate layers on the first upperstructure; separation structures penetrating the first and second upperstructures and extending into the lower structure on the lowerstructure; a memory vertical structure penetrating the first and secondupper structures and penetrating the lower and upper gate layers betweenthe separation structures; and a contact plug penetrating the first andsecond upper structures and spaced apart from the lower and upper gatelayers. The memory vertical structure includes a lateral surface havingat least one bent portion. The first contact plug includes a lateralsurface having at least one bent portion. The at least one bent portionof the lateral surface of the memory vertical structure and the at leastone bent portion of the lateral surface of the contact plug are disposedbetween a first height level on which an uppermost gate layer of thelower gate layers is disposed and a second height level on which alowermost gate layer of the upper gate layers is disposed. Each of theseparation structures includes a vertical portion penetrating the firstand second upper structures and a lower portion extending into the lowerstructure. In the separation structures, a maximum width of the lowerportion adjacent to the vertical portion is greater than a width of thevertical portion adjacent to the lower portion.

BRIEF DESCRIPTION OF DRAWINGS

The above and other aspects, features, and advantages of the presentdisclosure will be more clearly understood from the following detaileddescription, taken in conjunction with the accompanying drawings, inwhich:

FIG. 1 is a plan diagram illustrating a semiconductor device accordingto an example embodiment of the present disclosure;

FIGS. 2A and 2B are cross-sectional diagrams illustrating asemiconductor device according to an example embodiment of the presentdisclosure;

FIGS. 3, 4, 5, 6A, 6B, 7, 8A, 8B, 9, 10, 11, 12, 13, and 14 arecross-sectional diagrams illustrating portions of various examples of asemiconductor device;

FIG. 15 is a cross-sectional diagram illustrating a modified example ofa semiconductor device;

FIG. 16 is a cross-sectional diagram illustrating another modifiedexample of a semiconductor device;

FIG. 17 is a cross-sectional diagram illustrating another modifiedexample of a semiconductor device;

FIG. 18 is a cross-sectional diagram illustrating another modifiedexample of a semiconductor device;

FIGS. 19A and 19B are other modified examples of a semiconductor device;

FIG. 20 is a cross-sectional diagram illustrating another modifiedexample of a semiconductor device;

FIG. 21 is a cross-sectional diagram illustrating another modifiedexample of a semiconductor device;

FIG. 22 is a cross-sectional diagram illustrating another modifiedexample of a semiconductor device;

FIG. 23 is a cross-sectional diagram illustrating another modifiedexample of a semiconductor device;

FIGS. 24, 25, and 26 are cross-sectional diagrams illustrating portionsof another modified example of a semiconductor device;

FIG. 27 is a cross-sectional diagram illustrating a portion of anothermodified example of a semiconductor device;

FIGS. 28A and 28B are cross-sectional diagrams illustrating anothermodified example of a semiconductor device;

FIGS. 29A and 29B are cross-sectional diagrams illustrating anothermodified example of a semiconductor device;

FIGS. 30A, 30B, and 31 are enlarged cross-sectional diagramsillustrating various other modified examples of a semiconductor device;

FIG. 32 is a cross-sectional diagram illustrating another modifiedexample of a semiconductor device;

FIGS. 33A to 39B are cross-sectional diagrams illustrating an exampleembodiment of a method of manufacturing a semiconductor device; and

FIGS. 40A to 41B are cross-sectional diagrams illustrating anotherexample embodiment of a method of manufacturing a semiconductor device.

DETAILED DESCRIPTION

Hereinafter, embodiments of the present disclosure will be described asfollows with reference to the accompanying drawings.

FIG. 1 is a plan diagram illustrating a semiconductor device accordingto an example embodiment. FIGS. 2A and 2B are cross-sectional diagramsillustrating a semiconductor device according to an example embodiment.FIG. 2A is a cross-sectional diagram along line I-I′ in FIG. 1 and FIG.2B is a cross-sectional diagram along line II-II′ in FIG. 1 .

Referring to FIGS. 1, 2A, and 2B, a lower structure 2 may be provided.The lower structure 2 may include a substrate 4, a lower integrationcircuit 6 on the substrate 4, a lower wiring structure 8, and a lowerinsulating structure 12. The substrate 4 may be a semiconductorsubstrate such as single crystalline silicon. The lower integrationcircuit 6 may include a circuit for operating a memory cell array whichmay store data in a memory device such as a flash memory or a variableresistive memory. The lower wiring structure 8 may include first tofourth lower pads 8 p 1, 8 p 2, 8 p 3, and 8 p 4.

The lower insulating structure 12 may include a first lower insulatinglayer 12 a covering the lower integration circuit 6 and the lower wiringstructure 8, an etch stop layer 12 b on the first lower insulating layer12 a, and a second lower insulating layer 12 c on the etch stop layer 12b.

A pattern structure 14 and a dummy pattern 14 d may be disposed on thelower insulating structure 12.

In an example embodiment, the pattern structure 14 may include a lowerpattern layer 16, an intermediate pattern layer 20 having an opening 19on the lower pattern layer 16, and an upper pattern layer 22 coveringthe intermediate pattern layer 20 on the lower pattern layer 16.

In an example embodiment, the pattern structure 14 may further include asacrificial pattern layer 18 surrounded by the lower pattern layer 16,the upper pattern layer 22, and the intermediate pattern layer 20 in aregion adjacent to an edge of the lower pattern layer 16.

In an example embodiment, the lower pattern layer 16 may include a firstpolysilicon, the intermediate pattern layer 20 may include a secondpolysilicon, and the upper pattern layer 22 may include a thirdpolysilicon. For example, the lower pattern layer 16, the intermediatepattern layer 20, and the upper pattern layer 22 may include polysiliconhaving N-type conductivity.

In an example embodiment, the pattern structure 14 may include a firstportion at which the lower pattern layer 16 is directly in contact withthe upper pattern layer 22, and a second portion in which theintermediate pattern layer 20 is interposed between the lower patternlayer 16 and the upper pattern layer 22. In the pattern structure 14,the first portion at each of which the lower pattern layer 16 isdirectly in contact with the upper pattern layer 22 may be configured asa plurality of first portions spaced apart from each other.

The dummy pattern 14 d may include a lower dummy pattern layer 16 d, asacrificial dummy pattern layer 18 d, and an upper dummy pattern layer22 d stacked in order and having lateral surfaces vertically aligned.

The lower dummy pattern layer 16 d may be formed with a material and/orto a thickness the same as those of the lower pattern layer 16. Thesacrificial dummy pattern layer 18 d may be formed with a materialand/or a thickness the same as those of the sacrificial pattern layer18. The upper dummy pattern layer 22 d may be formed with a materialand/or a thickness the same as those of the upper pattern layer 22.

At least a portion of the pattern structure 14 may have a thicknesssubstantially the same as a thickness of the dummy pattern 14 d. Forexample, a thickness of a second portion of the pattern structure 14 atwhich the intermediate pattern layer 20 is interposed between the lowerpattern layer 16 and the upper pattern layer 22 may be substantially thesame as a thickness of the dummy pattern 14 d.

The pattern structure 14 may include a first internal opening 14 a and asecond internal opening 14 b.

An intermediate insulating structure 26 may be disposed on the lowerstructure 2. The intermediate insulating structure 26 may surroundlateral surfaces of the pattern structure 14 and the dummy pattern 14 dand may have an upper surface coplanar with upper surfaces of thepattern structure 14 and the dummy pattern 14 d. The intermediateinsulating structure 26 may include a first intermediate insulatinglayer 26 a in the first internal opening 14 a, a second intermediateinsulating layer 26 b in the second internal opening 14 b, and anexternal intermediate insulating layer 26 c surrounding an externalsurface of the pattern structure 14 and surrounding a lateral surface ofthe dummy pattern 14 d. The intermediate insulating structure 26 mayinclude silicon oxide.

A contact pattern 30 in contact with the pattern structure 14 and padpatterns 34 spaced apart from the pattern structure 14 may be disposed.

The contact pattern 30 and each of the pad patterns 34 may penetrate theintermediate insulating structure 26, may extend downwardly, and maypenetrate the second lower insulating layer 12 c and the etch stop layer12 b in order.

In an example embodiment, the contact pattern 30, the pad patterns 34,the pattern structure 14, the dummy pattern 14 d, and the intermediateinsulating structure 26 may have upper surfaces coplanar with oneanother.

The pad patterns 34 may include a first internal pad pattern 34 a, asecond internal pad pattern 34 b, and an external pad pattern 34 c. Thefirst internal pad pattern 34 a may penetrate the first intermediateinsulating layer 26 a, the second lower insulating layer 12 c, and theetch stop layer 12 b in order and may be in contact with the first lowerpad 8 p 1. The second internal pad pattern 34 b may penetrate the secondintermediate insulating layer 26 b, the second lower insulating layer 12c, and the etch stop layer 12 b in order and may be in contact with thesecond lower pad 8 p 2. The external pad pattern 34 c may penetrate theexternal intermediate insulating layer 26 c, the second lower insulatinglayer 12 c, and the etch stop layer 12 b in order and may be in contactwith the third lower pad 8 p 3. Each of the pad patterns 34 may includea pad portion and a via portion extending downwardly from a portion ofthe pad portion.

The contact pattern 30 may include a contact portion and a via portionextending downwardly from a portion of the contact portion. In thecontact pattern 30, a portion of the contact portion may be in contactwith the pattern structure 14, and the via portion may be in contactwith the fourth lower pad 8 p 4. The contact pattern 30 may beelectrically connected to a ground region 5 of the substrate 4 throughthe lower wiring structure 8 including the fourth lower pad 8 p 4. Thesubstrate 4 may be a semiconductor substrate, and the ground region 5may have N-type conductivity. Accordingly, the pattern structure 14including the lower pattern layer 16 may be grounded to the substrate 4through the contact pattern 30. The contact pattern 30 which may groundthe pattern structure 14 may improve reliability of the semiconductordevice.

The contact pattern 30 and the pad patterns 34 may include a commonconductive material. For example, the contact pattern 30 and the padpatterns 34 may include a barrier material layer such as metal nitride(e.g., TiN) and a gap-fill material layer such as a metal (e.g., W, orthe like).

In an example embodiment, the contact pattern 30 may further include ametal-semiconductor compound layer (e.g., a metal-silicide such as TiSi,TaSi, WSi, CoSi, NiSi, or the like) in contact with the patternstructure 14, rather than the pad patterns 34. The pad patterns 34 maynot include the metal-semiconductor compound layer.

On a plane illustrated in FIG. 1 , the pattern structure 14 may includeexternal openings 14 c (in FIG. 1 ) configured as open-type openings,and protrusions 14 p (in FIG. 1 ) spaced apart from each other by theexternal openings 14 c (in FIG. 1 ), on an edge portion thereof.

On a plane illustrated in FIG. 1 , the contact pattern 30 may include aline portion 30L (in FIG. 1 ) crossing the protrusions 14 p (in FIG. 1 )and the external openings 14 c (in FIG. 1 ), and an extension portion30P (in FIG. 1 ) extending from the line portion 30L (in FIG. 1 ) to anexternal side of the pattern structure 14.

A first upper structure 39 and a second upper structure 55 may bestacked in order on the pattern structure 14 and the intermediateinsulating structure 26.

The first upper structure 39 may include a lower stack structure 41disposed on the pattern structure 14, and a lower capping insulatinglayer 47 covering the lower stack structure 41 and the externalintermediate insulating layer 26 c.

The second upper structure 55 may include an upper stack structure 57overlapping the lower stack structure 41 on the lower capping insulatinglayer 47, and an upper capping insulating layer 63 covering the upperstack structure 57 and the lower capping insulating layer 47.

The lower stack structure 41 may include lower interlayer insulatinglayers 42 and lower gate layers 45 alternately stacked on the patternstructure 14. The lower stack structure 41 may further include a lowermold layer. The lower mold layer may include first lower mold layers 44a overlapping the first intermediate insulating layer 26 a and disposedon a level the same as a level of the lower gate layers 45, and secondlower mold layers 44 b in contact with the second intermediateinsulating layer 26 b and disposed on a level the same as a level of thelower gate layers 45.

The upper stack structure 57 may include upper interlayer insulatinglayers 59 and upper gate layers 61 alternately stacked. The upper stackstructure 57 may further include upper mold layers 60 a disposed on alevel the same as a level of the upper gate layers 61. For example, theupper mold layers 60 a may overlap the first intermediate insulatinglayer 26 a and the first lower mold layers 44 a.

In an example embodiment, a memory cell array region MCA and anextension region EA adjacent to the memory cell array region MCA may bedisposed on the pattern structure 14.

The memory cell array region MCA may be a region in which the lower gatelayers 45 and the upper gate layers 61 are stacked in order, and theextension region EA may be a region in which the lower gate layers 45and the upper gate layers 61 stacked in order in the memory cell arrayregion MCA may extend and may form gate pads having a staircasestructure. Accordingly, the lower gate layers 45 may have first gatepads arranged in a first staircase structure in the extension region EA,and the upper gate layers 61 may have second gate pads arranged in asecond staircase structure in the extension region EA.

In example embodiments, each of the first and second staircasestructures may have various shapes such as a shape descending in onedirection or in two directions perpendicular to each other.

Separation structures 77 penetrating the first and second upperstructures 39 and 55 may be disposed.

The separation structures 77 may include main separation structures 77a, and auxiliary separation structures 77 b disposed between the mainseparation structures 77 a. The main separation structures 77 a mayextend in a first horizontal direction X and may separate or divide thefirst and second stack structures 41 and 57 in a second horizontaldirection Y. A length of each of the main separation structures 77 a inthe first horizontal direction X may be greater than a length of each ofthe auxiliary separation structures 77 b in the first horizontaldirection X. In an example embodiment, each of the separation structures77 may be formed of an insulating material. In another exampleembodiment, each of the separation structures 77 may include aconductive material layer and an insulating material layer surrounding alateral surface of the conductive material layer.

Memory vertical structures 67 penetrating the first and second upperstructures 39 and 55 may be disposed in the memory cell array regionMCA. Each of the memory vertical structures 67 may include a datastorage layer which may store data. The memory vertical structures 67may be disposed on the pattern structure 14. The memory verticalstructures 67 may be in contact with the pattern structure 14.

In the memory cell array region MCA, a memory block region BLK may bedefined between a pair of main separation structures adjacent to eachother among the main separation structures 77 a. The memory block regionBLK may include the lower and upper gate layers 45 and 61 and the memoryvertical structures 67. A plurality of the memory block regions BLK maybe disposed. The lower and upper mold layers 44 a, 44 b, and 60 a may bedisposed in a connection region DB adjacent to the memory block regionBLK in the second horizontal direction Y.

On a plane illustrated in FIG. 1 , the first intermediate insulatinglayer 26 a may be adjacent to the memory block region BLK in the secondhorizontal direction Y. On a plane illustrated in FIG. 1 , the secondintermediate insulating layer 26 b may be disposed in the extensionregion EA adjacent to the memory block region BLK in the firsthorizontal direction X.

A first internal contact plug 81 extending in a vertical direction Z onthe first internal pad pattern 34 a and penetrating the first and secondupper structures 39 and 55, a second internal contact plug 83 extendingin the vertical direction Z on the second internal pad pattern 34 b andpenetrating the first and second upper structures 39 and 55, a sourcecontact plug 85 extending in the vertical direction Z on the contactpattern 30 and penetrating the first and second upper structures 39 and55, and an external contact plug 87 extending in the vertical directionZ on the external pad pattern 34 c and penetrating the first and secondupper structures 39 and 55 may be disposed.

The first internal contact plug 81 may be in contact with the firstinternal pad pattern 34 a, may extend in the vertical direction Z, andmay penetrate the lower interlayer insulating layers 42, the first lowermold layers 44 a, the lower capping insulating layer 47, the upperinterlayer insulating layers 59, the upper mold layers 60 a, and theupper capping insulating layer 63. The second internal contact plug 83may be in contact with the second internal pad pattern 34 b, may extendin the vertical direction Z and may penetrate the lower interlayerinsulating layers 42, the second lower mold layers 44 b, the lowercapping insulating layer 47, and the upper capping insulating layer 63.The source contact plug 85 may be in contact with the contact pattern30, may extend in the vertical direction Z, and may penetrate the lowerand upper capping insulating layers 47 and 63. The external contact plug87 may be in contact with the external pad pattern 34 c, may extend inthe vertical direction Z, and may penetrate the lower and upper cappinginsulating layers 47 and 63.

The first internal contact plug 81, the second internal contact plug 83,the source contact plug 85, and the external contact plug 87 may beformed of the same conductive material.

In an example embodiment, the separation structures 77, the memoryvertical structures 67, the first internal contact plug 81, the secondinternal contact plug 83, the source contact plug 85, and the externalcontact plug 87 may have upper surfaces coplanar with one another.

In an example embodiment, a lower surface of the memory verticalstructures 67 may be disposed to be lower than lower surfaces of thefirst internal contact plug 81, the second internal contact plug 83, thesource contact plug 85, and the external contact plug 87.

In an example embodiment, a lower surface of the memory verticalstructures 67 may be disposed to be lower than lower surfaces of theseparation structures 77.

In an example embodiment, the lower surfaces of the separationstructures 77 may be disposed to be lower than lower surfaces of thefirst internal contact plug 81, the second internal contact plug 83, thesource contact plug 85, and the external contact plug 87.

In example embodiments, in the comparison between heights of one elementand the other element, the heights may be defined with reference to anupper surface of the lower structure 2. For example, the configurationin which the lower surface of the memory vertical structures 67 isdisposed to be lower than a lower surface of the first internal contactplug 81 may indicate that a level of the lower surface of the memoryvertical structures 67 is lower than a level of the lower surface of thefirst internal contact plug 81 with reference to the upper surface ofthe lower structure 2.

In an example embodiment, each of the separation structures 77, thememory vertical structures 67, the first internal contact plug 81, thesecond internal contact plug 83, the source contact plug 85, and theexternal contact plug 87 may have a lateral surface having at least onebent portion.

In an example embodiment, the at least one bent portion in theseparation structures 77, the memory vertical structures 67, the firstinternal contact plug 81, the second internal contact plug 83, thesource contact plug 85, and the external contact plug 87 may be disposedbetween a first height level on which an uppermost gate layer of thelower gate layers 45 is disposed and a second height level on which alowermost gate layer of the upper gate layers 61 is disposed.

In an example embodiment, each of the separation structures 77, thememory vertical structures 67, the first internal contact plug 81, thesecond internal contact plug 83, the source contact plug 85, and theexternal contact plug 87 may include a lower vertical portion in thefirst upper structure 39, an upper vertical portion in the second upperstructure 55, and an intermediate portion disposed between the lowervertical portion and the upper vertical portion. The intermediateportion may be a portion between the lower vertical portion and theupper vertical portion at which a width may change. The intermediateportion may be referred to as a width changing portion or a steppedportion. For example, each of the separation structures 77 may include alower vertical portion 77L in the first upper structure 39, an uppervertical portion 77U in the second upper structure 55, and anintermediate portion 77V between the lower vertical portion 77L and theupper vertical portion 77U at which a stepped portion is formed and/or awidth changes.

An upper insulating structure 101 may be disposed on the second upperstructure 55. The upper insulating structure 101 may include a firstupper insulating layer 103, a second upper insulating layer 105, and athird upper insulating layer 107 stacked in order. The first to thirdupper insulating layers 103, 105, and 107 may be formed of siliconoxide.

Gate contact plugs 91 penetrating the first upper insulating layer 103,extending downwardly, and in contact with gate pads of the lower andupper gate layers 45 and 61 may be disposed. The gate contact plugs 91may be formed of a conductive material.

Bit lines 115 a, gate connection wirings 115 b, a source connectionwiring 115 d, and an external connection wiring 115 c may be disposed onthe third upper insulating layer 107.

In the description below, one of the memory vertical structures 67, oneof the bit lines 115 a, one of the gate connection wirings 115 b, andone of the gate contact plugs 91 will be described for ease ofdescription.

A first lower connection plug 111 a and a first upper connection plug113 a for electrically connecting the bit lines 115 a to the memoryvertical structures 67 may be disposed. A second lower connection plug111 b and a second upper connection plug 113 b for electricallyconnecting the bit lines 115 a to the first internal contact plug 81 maybe disposed.

A third lower connection plug 111 c and a third upper connection plug113 c for electrically connecting the gate connection wirings 115 b tothe second internal contact plug 83 may be disposed. A fourth lowerconnection plug 111 d and a fourth upper connection plug 113 d forelectrically connecting the gate connection wirings 115 b to the gatecontact plugs 91 may be disposed. A fifth lower connection plug 111 eand a fifth upper connection plug 113 e for electrically connecting thesource connection wiring 115 d to the source contact plug 85 may bedisposed. A sixth lower connection plug 111 f and a sixth upperconnection plug 113 f for electrically connecting the externalconnection wiring 115 c to the external contact plug 87 may be disposed.

The first to sixth upper connection plugs 113 a to 113 f may be disposedon the first to sixth lower connection plugs 111 a to 111 f.

In an example embodiment, one or a plurality of the external contactplugs 87 may be disposed on a single external pad pattern 34 c. Forexample, a plurality of the external contact plugs 87 may be disposed onone of the external pad patterns 34 c.

In an example embodiment, the plurality of external contact plugs 87 maybe disposed on one of the external pad patterns 34 c, and a single sixthlower connection plug 111 f may be disposed on the plurality of externalcontact plugs 87. Accordingly, the plurality of external contact plugs87 may be disposed between the single external pad patterns 34 c and thesingle sixth lower connection plug 111 f. Each of the single externalpad pattern 34 c and the sixth lower connection plug 111 f may have awidth greater than a width of each of the plurality of external contactplugs 87.

In another example embodiment, the lower structure 2, the patternstructure 14, and the intermediate insulating structure 26 may bereplaced with a single semiconductor substrate. For example, theseparation structures 77, the memory vertical structures 67, the firstinternal contact plug 81, the second internal contact plug 83, thesource contact plug 85, and the external contact plug 87 may be disposedon the semiconductor substrate.

In the description below, example embodiments of the memory verticalstructures 67, the gate layers 45 and 59 and the pattern structure 14described with reference to FIGS. 1, 2A, and 2B will be described withreference to FIGS. 3 and 4 . FIG. 3 is an enlarged diagram illustratinga portion of region marked “A” in FIG. 2A, and FIG. 4 is an enlargeddiagram illustrating a portion of region marked “Aa” in FIG. 3 .

Referring to FIGS. 2A, 3, and 4 , the memory vertical structure 67 maypenetrate the upper pattern layer 22 and the intermediate pattern layer20 in order and may extend into the lower pattern layer 16. The memoryvertical structure 67 may include a core region 73, a channel layer 71,a channel pad 75, and a data storage structure 69.

The channel layer 71 may cover a lateral surface and a bottom surface ofthe core region 73. The channel layer 71 may be formed of asemiconductor material such as silicon. The channel pad 75 may bedisposed on the core region 73 and may be in contact with the channellayer 71. The channel pad 75 may be formed of polysilicon having N-typeconductivity. The data storage structure 69 may be interposed betweenthe channel layer 71 and the first and second upper structures 39 and55. A portion of the data storage structure 69 may be interposed betweenthe channel layer 71 and the lower pattern layer 16. The intermediatepattern layer 20 may be in contact with the channel layer 71. A portionof the data storage structure 69 may be interposed between the upperpattern layer 22 and the channel layer 71.

The data storage structure 69 may include a first dielectric layer 69 a,a second dielectric layer 69 c, and a data storage layer 69 b disposedbetween the first dielectric layer 69 a and the second dielectric layer69 c. At least one of the first and second dielectric layers 69 a and 69c may include silicon oxide and/or a high-k dielectric.

In an example embodiment, the data storage layer 69 b may includeregions which may store data in a semiconductor device such as a NANDflash memory device. For example, the data storage layer 69 b mayinclude regions which may store data between gate layers of the lowerand upper gate layers 45 and 61 which may be word lines, and the channellayer 71. The data storage layer 69 b may include a material which maytrap an electric charge, such as silicon nitride, for example.

Each of the lower gate layers 45 may include a first lower gate layer 45a and a second lower gate layer 45 b. The first lower gate layer 45 amay cover an upper surface and a lower surface of the second lower gatelayer 45 b and may extend to a region between the memory verticalstructures 67 and a lateral surface of the second lower gate layer 45 b.Each of the upper gate layers 61 may include a first upper gate layer 61a and a second upper gate layer 61 b. The first upper gate layer 61 amay cover an upper surface and a lower surface of the second upper gatelayer 61 b and may extend to a region between the memory verticalstructures 67 and a lateral surface of the second upper gate layer 61 b.

In an example embodiment, the first lower gate layer 45 a and the firstupper gate layer 61 a may include a dielectric material, and the secondlower gate layer 45 b and the second upper gate layer 61 b may include aconductive material. For example, the first lower gate layer 45 a andthe first upper gate layer 61 a may include a high-k dielectric such asAlO, or the like, and the second lower gate layer 45 b and the secondupper gate layer 61 b may include a conductive material such as TiN, WN,Ti, or W.

In another example embodiment, the first lower gate layer 45 a and thefirst upper gate layer 61 a may include a first conductive material(e.g., TiN or W), and the second lower gate layer 45 b and the secondupper gate layer 61 b may include a second conductive material (e.g., Tior W) different from the first conductive material.

In another example embodiment, each of the lower and upper gate layers45 and 61 may be formed of a doped polysilicon, a metal-semiconductorcompound (e.g., TiSi, TaSi, CoSi, NiSi, or WSi), metal nitride (e.g.,TiN, TaN, or WN), or a metal (e.g., Ti or W).

Referring to FIG. 4 , the memory vertical structure 67 may include alower vertical portion 67L penetrating the first upper structure 39, anupper vertical portion 67U penetrating the second upper structure 55,and an intermediate portion 67V disposed between the lower verticalportion 67L and the upper vertical portion 67U.

In the memory vertical structure 67, the intermediate portion 67V may bea width changing portion, a stepped portion, or a bent portion.

The memory vertical structure 67 may include a lateral surface having atleast one bent portion. For example, with reference to a centralvertical axis Cz disposed between both lateral surfaces of the memoryvertical structure 67, the memory vertical structure 67 may include afirst bent portion BP1 a bent from an upper end of a lateral surface ofthe lower vertical portion 67L towards the central vertical axis Cz, anda second bent portion BP1 b bent from a lower end of a lateral surfaceof the upper vertical portion 67U towards the central vertical axis Cz.

At least one of the data storage structure 69 and the channel layer 71of the memory vertical structures 67 may include a bent portion belowthe second upper structure 55. For example, as illustrated in thecross-sectional surface in FIG. 4 , the channel layer 71 may include alower linear portion 71L disposed in the first upper structure 39, anupper linear portion 71U disposed in the second upper structure 55, anda bent portion 71B bent from an upper portion of the lower linearportion 71L and extending up to a lower portion of the upper linearportion 71U. The upper linear portion 71U and the lower linear portion71L may not be vertically aligned or may not be self-aligned. The bentportion 71B may be disposed further below than a lowermost layer 59 ofthe first upper structure 39.

In the description below, a modified example of the memory verticalstructures 67 described with reference to FIG. 4 will be described withreference to FIG. 5 . FIG. 5 is an enlarged diagram illustrating amodified example of portion marked “Aa” in FIG. 3 .

In the modified example, referring to FIGS. 3 and 5 , with reference tothe central vertical axis Cz disposed between both lateral surfaces ofthe memory vertical structures 67, each of the memory verticalstructures 67 may include a lateral surface including a first bentportion BP1 a′ bent from an upper end of a lateral surface of the lowervertical portion 67L towards the central vertical axis Cz, and a secondbent portion BP1 b′ bent from a lower end of a lateral surface of theupper vertical portion 67U towards the central vertical axis Cz. In thememory vertical structures 67, the intermediate portion 67V may be aregion disposed between the first bent portion BP1 a′ and the secondbent portion BP1 b′. The second bent portion BP1 b′ may be disposed on alevel different from a level of the first bent portion BP1 a′. Forexample, the second bent portion BP1 b′ may be disposed on a levelhigher than the first bent portion BP1 a′. In an example, the bentportion may be an inflection portion.

At least one of the data storage structure 69 and the channel layer 71may include a bent portion disposed in the first and second upperstructures 39 and 55 adjacent to each other. For example, as illustratedin the cross-sectional surface in FIG. 5 , the channel layer 71 mayinclude a lower linear portion 71L′ disposed in the first upperstructure 39, an upper linear portion 71U′ disposed in the second upperstructure 55, and a bent portion 71B′ bent from an upper portion of thelower linear portion 71L′ and extending up to a lower portion of theupper linear portion 71U′. The upper linear portion 71U′ and the lowerlinear portion 71L′ may not be vertically aligned or may not beself-aligned.

A region of the bent portion 71B′ bent from an upper portion of thelower linear portion 71L′ may be disposed further below than a boundarysurface between the first and second upper structures 39 and 55, and aregion of the bent portion 71B′ bent from a lower portion of the upperlinear portion 71U′ may be disposed further above a boundary surfacebetween the first and second upper structures 39 and 55. A heightdifference H between a lower portion and an upper portion of the bentportion 71B′ may be greater than a thickness t1 of the channel layer 71.A height difference H between a lower portion and an upper portion ofthe bent portion 71B′ may be greater than a thickness t2 of the datastorage structure 69.

In the description below, example embodiments of the first and secondinternal pad patterns 34 a and 34 b, the contact pattern 30, theexternal pad pattern 34 c, the first and second internal contact plugs81 and 83, the source contact plug 85, the external contact plug 87, andthe sacrificial pattern layer 18, described with reference to FIGS. 2Aand 2B, will be described with reference to FIGS. 6A, 6B, and 7 . FIG.6A is an enlarged diagram illustrating portions of region marked “B1” inFIG. 2A and region marked “B2” in FIG. 2B. FIG. 6B is an enlargeddiagram illustrating portions of regions marked “B3” and “B4” in FIG.2B. FIG. 7 is an enlarged diagram illustrating common characteristics ofregions marked “Ba,” “Bb,” “Bc,” and “Bd” in FIGS. 6A and 6B.

Referring to FIGS. 2A, 2B, 6A, 6B, and 7 , in an example embodiment, thesacrificial pattern layer 18 (in FIGS. 2B and 6B) may include a firstlayer 18 a, a second layer 18 b, and a third layer 18 c stacked inorder. The first and third layers 18 a and 18 c may be formed of siliconoxide, and the second layer 18 b may be formed of silicon nitride. Inanother example embodiment, the second layer 18 b may be formed ofpolysilicon.

The first internal pad pattern 34 a (in FIGS. 2A and 6A) may include afirst pad portion 34 p 1 and a first via portion 34 v 1 extendingdownwardly from the first pad portion 34 p 1 and integrated with thefirst pad portion 34 p 1. The second internal pad pattern 34 b (in FIGS.2A and 6A) may include a second pad portion 34 p 2 and a second viaportion 34 v 2 extending downwardly from the second pad portion 34 p 2and integrated with the second pad portion 34 p 2. The external padpattern 34 c (in FIGS. 2A and 6B) may include a third pad portion 34 p 3and a third via portion 34 v 3 extending downwardly from the third padportion 34 p 3 and integrated with the third pad portion 34 p 3.

The contact pattern 30 (in FIGS. 2A and 6B) may include a contactportion 30 c in contact with the pattern structure 14, an extensionportion 30 e extending from the contact portion 30 c into the externalintermediate insulating layer 26 c, and a via portion 30 v extendingdownwardly from the extension portion 30 e and in contact with thefourth lower pad 8 p 4. The contact portion 30 c may overlap and be incontact with the pattern structure 14. The extension portion 30 e mayextend from the contact portion 30 c into the external intermediateinsulating layer 26 c and may be in contact with a portion of a lateralsurface of the pattern structure 14. The via portion 30 v may extenddownwardly from a lower portion of the extension portion 30 e and may bein contact with the fourth lower pad 8 p 4.

The contact pattern 30 may further include a lower protrusion 30 pprotruding downwardly from a lower portion of the extension portion 30e. The contact portion 30 c, the extension portion 30 e, the via portion30 v, and the lower protrusion 30 p of the contact pattern 30 may beintegrated with one another.

At least a portion of each of the first and second pad portions 34 p 1and 34 p 2, at least a portion of the external pad 34 p 3, and at leasta portion of the extension portion 30 e may have the same thickness.

Each of the first and second pad portions 34 p 1 and 34 p 2, the thirdpad portion 34 p 3, the contact portion 30 c, and the extension portion30 e may have a thickness less than a thickness of the pattern structure14.

Each of the first and second internal pad patterns 34 a and 34 b, theexternal pad pattern 34 c, and the contact pattern 30 may include a padgap-fill layer 36 b and a pad barrier layer 36 a covering a lateralsurface and a bottom surface of the pad gap-fill layer 36 b. The padbarrier layer 36 a may include metal nitride such as TiN, and the padgap-fill layer 36 b may include a metal such as W (i.e., tungsten), orthe like.

The contact pattern 30 may further include a metal-semiconductorcompound layer 35 in contact with the pattern structure 14. Themetal-semiconductor compound layer may include metal-silicide such asTiSi, TaSi, WSi, CoSi, or NiSi. In the contact pattern 30, themetal-semiconductor compound layer may be interposed between the padbarrier layer 36 a of the contact pattern 30 and the lower pattern layer16, and between the pad barrier layer 36 a of the contact pattern 30 andthe upper pattern layer 22.

Each of the first internal contact plug 81 (in FIGS. 2A and 6A), thesecond internal contact plug 83 (in FIGS. 2B and 6A), the source contactplug 85 (in FIGS. 2B and 6B), and the external contact plug 87 (in FIGS.2B and 6B) may include a contact gap-fill layer 80 b and a contactbarrier layer 80 a covering a lateral surface and a bottom surface ofthe contact gap-fill layer 80 b. The contact barrier layer 80 a mayinclude metal nitride such as TiN, and may include a metal such as W, orthe like.

As illustrated in the cross-sectional diagram illustrating a portion ofthe example embodiment in FIG. 7 , each of the first internal contactplug 81, the second internal contact plug 83, the source contact plug85, and the external contact plug 87 may include a contact lowervertical portion 80L penetrating the first upper structure 39, a contactupper vertical portion 80U penetrating the second upper structure 55,and a contact intermediate portion 80V disposed between the contactlower vertical portion 80L and the contact upper vertical portion 80U.The contact intermediate portion 80V may be a stepped portion. In anexample embodiment, the contact intermediate portion 80V may be disposedbelow the second upper structure 55. A width of the contact lowervertical portion 80L adjacent to the contact upper vertical portion 80Umay be greater than a width of the contact upper vertical portion 80Uadjacent to the contact lower vertical portion 80L.

In the first internal contact plug 81, the second internal contact plug83, the source contact plug 85, and the external contact plug 87, thecontact barrier layer 80 a may include a lower linear portion 80 aLdisposed in the first upper structure 39, an upper linear portion 80 aUdisposed in the second upper structure 55, and a bent portion 80 aB bentfrom an upper portion of the lower linear portion 80 aL and extending upto a lower portion of the upper linear portion 80 aU. The upper linearportion 80 aU and the lower linear portion 80 aL may not be verticallyaligned or may not be self-aligned. The bent portion 80 aB may bedisposed further below than the first upper structure 39.

In one of the first internal contact plug 81, the second internalcontact plug 83, the source contact plug 85, and the external contactplug 87, with reference to the central vertical axis Cz disposed betweenboth lateral surfaces of the plug, the plug may include a lateralsurface including a first bent portion BP2 a bent from an upper end of alateral surface of the contact lower vertical portion 80L towards thecentral vertical axis Cz and a second bent portion BP2 b bent from alower end of a lateral surface of the contact upper vertical portion 80Uin a direction of being spaced apart from the central vertical axis Cz.

In the description below, modified examples of the first internalcontact plug 81, the second internal contact plug 83, the source contactplug 85, and the external contact plug 87 described with reference toFIG. 7 will be described with reference to FIG. 8A. FIG. 8A is anenlarged diagram illustrating a modified example of a commoncharacteristic of regions marked “Ba,” “Bb,” “Bc,” and “Bd” in FIGS. 6Aand 6B.

In the modified example, referring to FIGS. 6A, 6B, and 8A, in the firstinternal contact plug 81, the second internal contact plug 83, thesource contact plug 85, and the external contact plug 87, the contactbarrier layer 80 a may include a lower linear portion 80 aL′ disposed inthe first upper structure 39, an upper linear portion 80 aU′ disposed inthe second upper structure 55, and a bent portion 80 aV′ extending froman upper portion of the lower linear portion 80 aL′ up to a lowerportion of the upper linear portion 80 aU′.

The bent portion 80 aV′ may be bent from an upper portion of the lowerlinear portion 80 aL′ in a horizontal direction towards the centralvertical axis Cz of the contact gap-fill layer 80 b, and may be bentfrom a lower portion of the upper linear portion 80 aU′ in a directionof being spaced apart from the central vertical axis Cz of the contactgap-fill layer 80 b.

In one of the first internal contact plug 81, the second internalcontact plug 83, the source contact plug 85, and the external contactplug 87, with reference to the central vertical axis Cz disposed betweenboth lateral surfaces of the plug, the plug may include a lateralsurface including a first bent portion BP2 a′ bent from an upper end ofa lateral surface of the contact lower vertical portion 80L towards thecentral vertical axis Cz, and a second bent portion BP2 b′ bent from alower end of a lateral surface of the contact upper vertical portion 80Uin a direction of being spaced apart from the central vertical axis Cz.The second bent portion BP2 b′ may be disposed on a level different froma level of the first bent portion BP2 a′. The second bent portion BP2 b′may be disposed on a level higher than a level of the first bent portionBP2 a′.

In the description below, other modified examples of the first internalcontact plug 81, the second internal contact plug 83, the source contactplug 85, and the external contact plug 87 described with reference toFIG. 7 will be described with reference to FIG. 8B. FIG. 8B is anenlarged diagram illustrating another modified example of a commoncharacteristic of the regions marked “Ba,” “Bb,” “Bc,” and “Bd” in FIGS.6A and 6B.

In a modified example, referring to FIGS. 6A, 6B, and 8B, in the firstinternal contact plug 81, the second internal contact plug 83, thesource contact plug 85, and the external contact plug 87, the contactbarrier layer 80 a may include a lower linear portion 80 aL″ disposed inthe first upper structure 39, an upper linear portion 80 aU″ disposed inthe second upper structure 55, and a bent portion 80 aV″ extending froman upper portion of the lower linear portion 80 aL″ and up to a lowerportion of the upper linear portion 80 aU″. The bent portion 80 aV″ maybe bent from an upper portion of the lower linear portion 80 aL″ in adiagonal direction towards the central vertical axis Cz of the contactgap-fill layer 80 b. In the bent portion 80 aV″, a portion bent from thelower linear portion 80 aL″ may be more adjacent to a boundary surfacebetween the first and second upper structures 39 and 55 than a portionbent from the upper linear portion 80 aU″.

In one of the first internal contact plug 81, the second internalcontact plug 83, the source contact plug 85, and the external contactplug 87, with reference to the central vertical axis Cz disposed betweenboth lateral surfaces of the plug, the plug may include a lateralsurface including a first bent portion BP2 a″ bent from an upper end ofa lateral surface of the contact lower vertical portion 80L towards thecentral vertical axis Cz, and a second bent portion BP2 b″ bent from alower end of a lateral surface of the contact upper vertical portion 80Uin a direction of being spaced apart from the central vertical axis Cz.The second bent portion BP2 b″ may be disposed on a level higher than alevel of the first bent portion BP2 a″, and the second bent portion BP2b″ may be more spaced apart from a boundary surface between the firstand second upper structures 39 and 55 than the first bent portion BP2a″.

In the description below, other modified examples of the first internalcontact plug 81, the second internal contact plug 83, the source contactplug 85, and the external contact plug 87 will be described withreference to FIGS. 9 and 10 . FIGS. 9 and 10 are enlarged diagramsillustrating a portion of region marked “B1” in FIG. 2A.

Referring to FIGS. 2A, 2B, and 9 , the first internal contact plug 81may include the contact lower vertical portion 80L, the contact uppervertical portion 80U, and the contact intermediate portion 80V as in theaforementioned example embodiment described with reference to FIG. 7 .

The first internal contact plug 81 may include a lower contact spacer180 a surrounding a lateral surface of the contact lower verticalportion 80L and an upper contact spacer 180 b surrounding a lateralsurface of the contact upper vertical portion 80U. A difference inwidths between the contact lower vertical portion 80L and the contactupper vertical portion 80U may be greater than a thickness of each ofthe lower contact spacer 180 a and the upper contact spacer 180 b.

The lower contact spacer 180 a and the upper contact spacer 180 b may bespaced apart from each other.

In an example embodiment, the lower contact spacer 180 a and the uppercontact spacer 180 b may be formed of the same insulating material,silicon oxide or silicon nitride, for example.

In another example embodiment, the lower contact spacer 180 a and theupper contact spacer 180 b may be formed of different insulatingmaterials. For example, one of the spacers may be formed of siliconoxide, and the other spacer may be formed of silicon nitride.

In an example embodiment, each of the second internal contact plug 83,the source contact plug 85, and the external contact plug 87 may have across-sectional surface structure the same as that of the first internalcontact plug 81. Accordingly, each of the second internal contact plug83, the source contact plug 85, and the external contact plug 87 mayinclude the lower contact spacer 180 a and the upper contact spacer 180b.

An upper end of the lower contact spacer 180 a and a lower end of theupper contact spacer 180 b may be disposed between a first height levelon which an uppermost gate layer of the lower gate layers 45 is disposedand a second height level on which a lowermost gate layer of the uppergate layers 61 is disposed.

In the description below, referring to FIGS. 2A, 2B, and 10 , the lowercontact spacer 180 a (in FIG. 9 ) and the upper contact spacer 180 b (inFIG. 9 ) spaced apart from each other, illustrated in FIG. 9 , may bemodified to a lower contact spacer 180 a′ and an upper contact spacer180 b′, respectively.

In an example embodiment, the lower contact spacer 180 a′ and the uppercontact spacer 180 b′ may be formed of the same insulating material ordifferent insulating materials, similarly to the lower contact spacer180 a (in FIG. 9 ) and the upper contact spacer 180 b (in FIG. 9 )illustrated in FIG. 9 .

In an example embodiment, the lower contact spacer 180 a′ and the uppercontact spacer 180 b′ may be in contact with each other and may form aboundary surface therebetween. The boundary surface between the lowercontact spacer 180 a′ and the upper contact spacer 180 b′ may bedisposed between a first height level on which an uppermost gate layerof the lower gate layers 45 is disposed and a second height level onwhich a lowermost gate layer of the upper gate layers 61 is disposed.

In the modified example, the lower contact spacer 180 a′ and the uppercontact spacer 180 b′ may be formed of the same material and may beintegrated with each other without a boundary surface therebetween.

In an example embodiment, the second internal contact plug 83, thesource contact plug 85, and the external contact plug 87 may have across-sectional surface structure the same as that of the first internalcontact plug 81. Accordingly, each of the second internal contact plug83, the source contact plug 85, and the external contact plug 87 mayinclude the lower contact spacer 180 a′ and the upper contact spacer 180b′.

In the description below, an example embodiment of the gate contactplugs 91 described with reference to FIGS. 1, 2A, and 2B will bedescribed with reference to FIG. 11 . FIG. 11 is an enlarged diagramillustrating portions of regions marked “C1” and “C2” in FIG. 2B.

Referring to FIGS. 2B and 11 , each of the gate contact plugs 91 mayinclude a gap-fill layer 90 b and a barrier layer 90 a covering alateral surface and a bottom surface of the gap-fill layer 90 b. In thegate contact plug 91, the barrier layer 90 a may include metal nitridesuch as TiN, and the gap-fill layer 90 b may include a metal surface W,or the like.

A gate contact plug of the gate contact plugs 91 in contact with a lowergate pad 45 p of the lower gate layer 45 may be a first gate contactplug, and a gate contact plug in contact with an upper gate pad 61 p ofthe upper gate layer 61 may be a second gate contact plug. The firstgate contact plug 91 on the lower gate pad 45 p of the lower gate layer45 may be in contact with the second lower gate layer 45 b of the lowergate layer 45, and the second gate contact plug 91 on the upper gate pad61 p of the upper gate layer 61 may be in contact with the second uppergate layer 61 b of the upper gate layer 61.

In the description below, an example embodiment of the contact pattern30 described with reference to FIGS. 1, 2A, and 2B will be describedwith reference to FIGS. 6B and 12 . FIG. 12 is an enlarged diagramillustrating a portion of region “D” in FIG. 2B. The contact pattern 30has been described with reference to the region “B3” in FIG. 6B. Thus,the structure of the contact pattern 30 described with reference to FIG.6B will be described in greater detail with reference to FIG. 12 .

Referring to FIGS. 2B, 6B, and 12 , the contact pattern 30 may includethe upper contact portion 30 c, the extension portion 30 e, the lowerprotrusion 30 p, and the via portion 30 v, described in theaforementioned example embodiment with reference to FIG. 6B.

A thickness Da of the contact portion 30 c may be greater than a sum ofa thickness of the intermediate pattern layer 20 and a thickness of theupper pattern layer 22. The thickness Da of the contact portion 30 c maybe less than a maximum thickness Ta of the lower pattern layer 16. Thethickness Da of the contact portion 30 c may be less than a thickness Tbof the lower pattern layer 16 overlapping the contact portion 30 c. Thethickness Da of the extension portion 30 e may be greater than athickness of the contact portion 30 c. A distance Dc between an uppersurface of the extension portion 30 e and a bottom surface of the lowerprotrusion 30 p may be greater than a thickness Db of the extensionportion 30 e.

In the description below, a modified example of the pattern structure 14described in the aforementioned example embodiment with reference toFIG. 2B will be described. FIG. 13 is an enlarged diagram illustrating amodified example of a portion marked “D” in FIG. 2B.

Referring to FIG. 13 , in the pattern structure 14, the sacrificialpattern layer 18 (in FIG. 2B) may be replaced with an intermediatepattern layer 20′. Thus, the pattern structure 14 may not include thesacrificial pattern layer 18 (in FIG. 2B) as in FIG. 2B.

In the description below, a modified example of the contact pattern 30described in FIGS. 2B, 6B, and 12 will be described with reference toFIG. 14 . FIG. 14 is an enlarged diagram illustrating a modified exampleof region “D” in FIG. 2B.

Referring to FIG. 14 , a modified contact pattern 30′ may include acontact portion 30 c′, an extension portion 30 e′, a lower protrusionportion 30 p′, and a via portion 30 v′.

The contact portion 30 c′ may overlap the pattern structure 14 and maybe in contact with the upper pattern layer 22. A portion 22L of theupper pattern layer 22 may be interposed between the contact portion 30c′ and the lower pattern layer 16. The extension portion 30 e′ mayextend from the contact pattern 30′ and may be in contact with a lateralsurface of the upper pattern layer 22 and a portion of a lateral surfaceof the lower pattern layer 16. The lower protrusion portion 30 p′ andthe via portion 30 v′ may correspond to the lower protrusion 30 p andthe via portion 30 v described in FIG. 6B, respectively. The contactpattern 30′ may include the metal-semiconductor compound layer 35, thepad barrier layer 36 a, and the pad gap-fill layer 36 b.

In the description below, a modified example of a semiconductor devicewill be described with reference to FIG. 15 . FIG. 15 is across-sectional diagram along line III-III′ in FIG. 1 illustrating amodified example of a semiconductor device.

Referring to FIGS. 1 and 15 , the lower structure 2, the patternstructure 14, the first and second upper structures 39 and 55, and theseparation structures 77, described with reference to FIGS. 1, 2A, and2B, may be provided.

An internal contact pattern 130 penetrating the pattern structure 14 maybe disposed in a portion of the pattern structure 14 in which the lowerpattern layer 16 is in contact with the upper pattern layer 22 throughan opening 19′ of the intermediate pattern layer 20.

The internal contact pattern 130 may be in contact with a lower pad 8 p4′ of the lower wiring structure 8 penetrating the lower pattern layer16 and the upper pattern layer 22 in contact with each other andextending downwardly.

The internal contact pattern 130 may include the pad gap-fill layer 36b, and the pad barrier layer 36 a covering a lateral surface and abottom surface of the pad gap-fill layer 36 b, described with referenceto FIGS. 2A, 2B, 6A, and 6B. The internal contact pattern 130 mayfurther include a metal-semiconductor compound layer 35′ disposedbetween the pad barrier layer 36 a and the pattern structure 14.

In an example embodiment, both the internal contact pattern 130 and thecontact pattern 360 (in FIG. 2B) may be disposed.

In another example embodiment, one of the internal contact pattern 130and the contact pattern 360 (in FIG. 2B) may not be provided.

In the description below, a modified example of the gate contact plugs91 in FIG. 2B will be described in FIG. 16 . FIG. 16 is across-sectional diagram along line II-II′ in FIG. 1 .

Referring to FIG. 16 , the gate contact plugs 91 (in FIG. 2B) mayinclude first gate contact plugs 91 a on the lower gate pad 45 p (inFIG. 11 ) of the lower gate layers 45 and second gate contact plugs 91 bon the upper gate pads 61 p (in FIG. 11 ) of the upper gate layers 61.

The first gate contact plugs 91 a may have a cross-sectional surfacestructure similar to the first internal contact plug 81, the secondinternal contact plug 83, the source contact plug 85 and the externalcontact plug 87. For example, each of the first gate contact plugs 91 amay include a lower vertical portion 91L in the first upper structure39, an upper vertical portion 91U in the second upper structure 55, andan intermediate portion 91V disposed between the lower vertical portion91L and the upper vertical portion 91U. In the first gate contact plugs91 a, the intermediate portion 91V may be substantially the same as theintermediate portion 80V of each of the first internal contact plug 81,the second internal contact plug 83, the source contact plug 85, and theexternal contact plug 87 described with reference to FIGS. 6A, 6B, and 7. In the first gate contact plugs 91 a, the intermediate portion 91V maybe modified the same as the intermediate portions 80V in FIGS. 8A and8B.

In the description below, a modified example of the separationstructures 77 in FIG. 2A will be described. FIG. 17 is a cross-sectionaldiagram along line I-I′ in FIG. 1 .

Referring to FIG. 17 , the separation structures 77 (in FIG. 2A) may bemodified to separation structures 77′ extending upwardly from a portionpenetrating the second upper structure 55 and penetrating the firstupper insulating layer 103. Accordingly, an upper surface of theseparation structure 77′ may be disposed on a level higher than uppersurfaces of the memory vertical structures 67, the first and secondinternal contact plugs 81 and 83 (in FIGS. 2A and 2B, respectively), thesource contact plug 85 (in FIG. 2B) and the external contact plug 87 (inFIG. 2B). Each of the separation structure 77′ may include theintermediate portion 77V described with reference to FIG. 2A.

In the description below, a modified example of the separationstructures 77′ in FIG. 17 will be described with reference to FIG. 18 .FIG. 18 is a cross-sectional diagram along line I-I′.

Referring to FIG. 18 , the separation structures 77′ in FIG. 17 may bemodified to the separation structures 77″ which do not include anintermediate portion. Accordingly, each of the separation structures 77″may have a lateral surface having a predetermined slope.

In the description below, a modified example of a semiconductor devicewill be described with reference to FIGS. 19A and 19B. FIG. 19A is across-sectional diagram along line I-I′ in FIG. 1 , and FIG. 19B is across-sectional diagram along line II-II′ in FIG. 1 . In the modifiedexample described with reference to FIGS. 19A and 19B, a modifiedportion of the semiconductor device described with reference to FIGS. 2Aand 2B will be described.

Referring to FIGS. 1, 19A, and 19B, the upper insulating structure 101in FIGS. 2A and 2B may be modified to an upper insulating structure 201including first, second, third, and fourth upper insulating layers 203,205, 206, and 207 stacked in order.

In an example embodiment, the separation structures 77 in FIG. 2A may bemodified to separation structures 177 extending upwardly from a portionpenetrating the second upper structure 55 and penetrating the firstupper insulating layer 203, and the separation structures 177 may notinclude the intermediate portion 77V as in FIG. 2B. Accordingly, each ofthe separation structures 177 may have a lateral surface having apredetermined slope.

In an example embodiment, the first internal contact plug 81 may bemodified to a first internal contact plug 181 extending upwardly from aportion penetrating the second upper structure 55 and penetrating thefirst and second insulating layers 203 and 205.

In an example embodiment, the second internal contact plug 83, thesource contact plug 85, and the external contact plug 87 in FIG. 2B maybe modified to a second internal contact plug 183, a source contact plug185, and an external contact plug 187, respectively, which may extendupwardly from a portion penetrating the second upper structure 55 andmay penetrate the first and second upper insulating layers 203 and 205.

In an example embodiment, the gate contact gate 91 in FIG. 2B may bemodified to a gate contact plug 191 which may extend upwardly from aportion penetrating the second upper structure 55 and may penetrate thefirst and second upper insulating layers 203 and 205.

The second internal contact plug 183, the source contact plug 185, theexternal contact plug 187, and the gate contact plug 191 may have uppersurfaces coplanar with one another.

The separation structures 177 may have upper surfaces higher than anupper surface of the memory vertical structure 67 and lower than uppersurfaces of the second internal contact plug 183, the source contactplug 185, the external contact plug 187, and the gate contact plug 191.

In the description below, modified examples of the separation structures177 in FIG. 19A and the source contact plug 185 and the external contactplug 187 in FIG. 19B will be described with reference to FIGS. 20 and 21. FIG. 20 is a cross-sectional diagram taken long I-I′ in FIG. 1 , andFIG. 21 is a cross-sectional diagram taken long II-II′ in FIG. 1 .

Referring to FIGS. 20 and 21 , the separation structures 177 in FIG. 19Amay be modified to separation structures 277 including the intermediateportion 77V as in FIG. 2A. The source contact plug 185 and the externalcontact plug 187 in FIG. 19B may be modified to a source contact plug285 and an external contact plug 287, each of which does not include anintermediate portion and has a lateral surface substantially having apredetermined slope, respectively.

In the description below, a modified example of each of variousseparation structures 77, 77′, 77,″ 177, and 277 (in FIGS. 2A, 17, 18,19A, and 20 , respectively), described in the aforementioned exampleembodiment, will be described with reference to FIG. 22 . FIG. 22 is across-sectional diagram illustrating a common portion of the variousseparation structures 77, 77′, 77,″ 177, and 277 (in FIGS. 2A, 17, 18,19A, and 20 , respectively), described in the aforementioned exampleembodiment.

Referring to FIG. 22 , a separation structure 377 which may replace alower portion of each of the separation structures 77, 77′, 77,″ 177,and 277 (in FIGS. 2A, 17, 18, 19A, and 20 , respectively).

Each of the separation structures 377 may include a vertical portion 377a penetrating the first upper structure 39 and a lower portion 377 bextending from the vertical portion 377 a into the lower structure, thepattern structure 14, for example. In each of the separation structures377, a maximum width of the lower portion 377 b adjacent to the verticalportion 377 a penetrating the first upper structure 39 may be greaterthan a width of the vertical portion 377 a adjacent to the lower portion377 b.

In each of the separation structures 377, the lower portion 377 b mayinclude first and second portions 377L1 and 377L2. For example, in eachof the separation structures 377, the first lower portion 377L1 may bedisposed in a portion in which the upper pattern layer 22 of the patternstructure 14 is directly in contact with the lower pattern layer 16, andthe second lower portion 377L2 may be disposed in a portion in which theintermediate pattern layer 20 and the upper pattern layer 22 are stackedin order. The first lower portion 377L1 may penetrate the upper patternlayer 22 and may be directly in contact with the lower pattern layer 16.The second lower portion 377L2 may include a first portion 377L2 apenetrating the upper pattern layer 22 and a second portion 377L2 bpenetrating the intermediate pattern layer 20.

The first lower portion 377L1 may have a width decreasing from an upperportion to a lower portion. The first lower portion 377L1 may have alateral surface having a negative slope. In the second lower portion377L2, the first lower portion 377L1 and the second lower portion 377L2may have lateral surfaces having different slopes. In the second lowerportion 377L2, the second portion 377L2 b may have a lateral surfacehaving a negative slope to have a width decreasing from an upper portionto a lower portion.

A maximum width of the first lower portion 377L1 may be greater than awidth of a vertical portion 377 a penetrating the first upper structure39 adjacent to the first lower portion 377L1. A width of a verticalportion 377 a penetrating the first upper structure 39 adjacent to thesecond lower portion 377L2 may be less than a maximum width of the firstportion 377L2 a of the second lower portion 377L2. In the second lowerportion 377L2, a width of the first portion 377L2 a adjacent to thesecond portion 377L2 b may be less than a width of the second portion377L2 b adjacent to the first portion 377L2 a.

In the description below, a modified example of the separation structure377 described with reference to FIG. 22 will be described with referenceto FIG. 23 . FIG. 23 is a cross-sectional diagram illustrating a commonportion of the separation structures 77, 77′, 77,″ 177, and 277 (inFIGS. 2A, 17, 18, 19A, and 20 , respectively), described in theaforementioned example embodiment.

Referring to FIG. 23 , a first portion 377L1′ which may replace thefirst portion 377L1 (in FIG. 22 ) of the separation structure 377described with reference to FIG. 22 may be provided. A bottom surface ofthe first portion 377L1′ may be disposed in the upper pattern layer 22and may be spaced apart from the lower pattern layer 16. Accordingly, aportion of the upper pattern layer 22 may be disposed between a bottomsurface of the first portion 377L1′ of the separation structure 377 andthe lower pattern layer 16.

In the description below, a memory vertical structure 167 which mayreplace the memory vertical structure 67 (in FIGS. 2A and 3 ) will bedescribed with reference to FIG. 24 . FIG. 24 is an enlarged diagramillustrating a portion of a modified example of region marked “A” inFIG. 2A.

Referring to FIG. 24 , the memory vertical structure 167 may include alower vertical portion 167L in the first upper structure 39, an uppervertical portion 167U in the second upper structure 55, and anintermediate portion 167Va disposed between the lower vertical portion167L and the upper vertical portion 167U.

In the memory vertical structure 167, the intermediate portion 167Va maybe greater than a width of the upper vertical portion 167U adjacent tothe intermediate 167Va. In the memory vertical structure 167, theintermediate portion 167Va may be greater than a width of the lowervertical portion 167L adjacent to the intermediate portion 167Va.

In an example embodiment, a thickness of the intermediate portion 167Vamay be greater than a thickness of each of the lower and upper gatelayers 45 and 61.

In the description below, a first internal contact plug 481, a secondinternal contact plug 483, a source contact plug 485, and an externalcontact plug 487 which may replace the first internal contact plug 81(in FIGS. 2A and 6A), the second internal contact plug 83 (in FIGS. 2Aand 6A), the source contact plug 85 (in FIGS. 2B and 6B), and theexternal contact plug 87 (in FIGS. 2B and 6B), respectively, will bedescribed with reference to FIGS. 25 and 26 . FIG. 25 is an enlargeddiagram illustrating a portion of a modified example of regions marked“B1” in FIG. 2A and “B2” in FIG. 2B, and FIG. 26 is an enlarged diagramillustrating a portion of a modified example of regions marked “B3” and“B4” in FIG. 2B.

Referring to FIGS. 25 and 26 , the first internal contact plug 481 (inFIG. 25 ) may include a lower vertical portion 481L in the first upperstructure 39, an upper vertical portion 481U in the second upperstructure 55, and an intermediate portion 481V disposed between thelower vertical portion 481L and the upper vertical portion 481U, and thesecond internal contact plug 483 (in FIG. 25 ) may include a lowervertical portion 483L in the first upper structure 39, an upper verticalportion 483U in the second upper structure 55, and an intermediateportion 483V disposed between the lower vertical portion 483L and theupper vertical portion 483U. The source contact plug 485 (in FIG. 26 )may include a lower vertical portion 485L in the first upper structure39, an upper vertical portion 485U in the second upper structure 55, andan intermediate portion 485V disposed between the lower vertical portion485L and the upper vertical portion 485U, and the external contact plug487 (in FIG. 26 ) may include a lower vertical portion 487L in the firstupper structure 39, an upper vertical portion 487U in the second upperstructure 55, and an intermediate portion 487V disposed between thelower vertical portion 487L and the upper vertical portion 487U.

In the first internal contact plug 481, the second internal contact plug483, the source contact plug 485, and the external contact plug 487,each of the intermediate portions 481V, 483V, 485V, and 487V may have awidth greater than a width of each of the upper vertical portions 481U,483U, 485U, and 487U adjacent to the intermediate portions 481V, 483V,485V, and 487V, and may be greater than a width of each of the lowervertical portions 481L, 483L, 485L, and 487L adjacent to theintermediate portions 481V, 483V, 485V, and 487V.

In an example embodiment, a thickness of each of the intermediateportions 481V, 483V, 485V, and 487V may be greater than a thickness ofeach of the lower and upper gate layers 45 and 61.

Each of the first internal contact plug 481, the second internal contactplug 483, the source contact plug 485, and the external contact plug 487may include the contact gap-fill layer 80 b and the contact barrierlayer 80 a covering a bottom surface and a lateral surface of thecontact gap-fill layer 80 b, similarly to the first internal contactplug 81 (in FIGS. 2A and 6A), the second internal contact plug 83 (inFIGS. 2A and 6A), the source contact plug 85 (in FIGS. 2B and 6B), andthe external contact plug 87 (in FIGS. 2B and 6B), respectively.

A plurality of the external contact plugs 487 may be disposed on asingle external pad pattern 34 c. Accordingly, the plurality of externalcontact plugs 487 may be disposed on a single external pad pattern 34 c.

In the first internal contact plug 481, the second internal contact plug483, the source contact plug 485, and the external contact plug 487, theintermediate portions 481V, 483V, 485V, and 487V may be applied to thefirst internal contact plug 81 (in FIGS. 2A and 6A), the second internalcontact plug 83 (in FIGS. 2A and 6A), the source contact plug 85 (inFIGS. 2B and 6B), and the external contact plug 87 (in FIGS. 2B and 6B),respectively, and may also be applied to the first internal contact plug181 (in FIG. 19A) the second internal contact plug 183 (in FIG. 19B),the source contact plug 185 (in FIG. 19A), and the external contact plug187 (in FIG. 19A), respectively, the modified examples described in theaforementioned example embodiment.

In the description below, an external contact plug 487′ which mayreplace the external contact plug 487 (in FIG. 26 ) described withreference to FIG. 26 will be described with reference to FIG. 27 . FIG.27 is an enlarged diagram illustrating a portion of a modified exampleof the example illustrated in FIG. 26 .

Referring to FIG. 27 , the external contact plug 487′ may include aplurality of lower vertical portions 487L′ in the first upper structure39, a plurality of upper vertical portions 487U′ in the second upperstructure 55, and a single intermediate portion 487V′ connecting theplurality of lower vertical portions 487L′ to the plurality of uppervertical portions 487U′.

In the external contact plug 487′, the plurality of lower verticalportions 487L′ may be in contact with the external pad pattern 34 c. Inthe external contact plug 487′, the plurality of upper vertical portions487U′ may be in contact with the sixth lower connection plug 111 f.

In the external contact plug 487′, the plurality of lower verticalportions 487L′, the intermediate portion 487V′, and the plurality ofupper vertical portions 487U′ may be integrated with one another withouta boundary surface therebetween.

The external contact plug 487′ may include a contact gap-fill layer 80 band a contact barrier layer 80 a covering a lateral surface and a bottomsurface of the contact gap-fill layer 80 b, similarly to the externalcontact plug 87 (in FIGS. 2B and 6B). The contact gap-fill layer 80 bmay be configured as a single material layer which may extend alongcentral portions of the plurality of lower vertical portions 487L′, theintermediate portion 487V′, and the plurality of upper vertical portions487U′ without a boundary surface.

In the description below, a pattern structure 114, a dummy pattern 114d, and a memory vertical structure 267 which may replace the patternstructure 14 (in FIGS. 2A and 2B), the dummy pattern 14 d (in FIG. 2B),and the memory vertical structure 67 (in FIGS. 2A, 2B, and 3 ),respectively, described with reference to FIGS. 2A and 2B, will bedescribed with reference to FIGS. 28A and 28B. FIG. 28A is across-sectional diagram illustrating a portion of a region taken alongline I-I′ in FIG. 1 , and FIG. 28B is a cross-sectional diagramillustrating a portion of a region taken along line II-II′ in FIG. 1 .

Referring to FIGS. 28A and 28B, the pattern structure 14 (in FIGS. 2Aand 2B) described with reference to FIGS. 2A and 2B may be replaced withthe pattern structure 114 which may be configured as a single materiallayer. The pattern structure 14 may be formed of polysilicon having aplanar upper surface. The dummy pattern 14 d (in FIG. 1 ) described withreference to FIG. 2B may be replaced with the dummy pattern 114 d whichmay be configured as a single material layer. The dummy pattern 114 dmay have a material and a thickness the same as those of the patternstructure 114.

The memory vertical structure 67 (in FIG. 13 ) described with referenceto FIGS. 2A and 2B may be replaced with a memory vertical structure 267which may further include a lower semiconductor layer 68. The memoryvertical structure 267 may include the lower semiconductor layer 68 incontact with the pattern structure 114 and extending in the verticaldirection Z, a core region 73 spaced apart from the lower semiconductorlayer 68 on the lower semiconductor layer 68, a channel layer 71interposed between the core region 73 and the lower semiconductor layer68 and extending to a lateral surface of the core region 73, and a datastorage structure 269 covering an external surface of the channel layer71. The data storage structure 269 may include a first dielectric layer69 a, a data storage layer 69 b, and a second dielectric layer 69 c,similarly to the data storage structure 69 (in FIG. 3 ) in FIG. 3 .

A gate insulating layer 43 may be disposed between a lowermost lowergate layer of the lower gate layers 45 and the lower semiconductor layer68 of the memory vertical structure 267.

In the description below, a pattern structure 514 which may replace thepattern structure 14 (in FIGS. 2A and 2B) described in theaforementioned example embodiment, a source contact plug 585 (in FIG.29B) which may replace the source contact plug 85 (in FIGS. 2B and 6B)described in the aforementioned example embodiment, a first internalcontact plug 581 (in FIGS. 29A and 30A) which may replace the firstinternal pad pattern 34 a (in FIGS. 2A and 6A) and the first internalcontact plug 81 (in FIGS. 2A and 6A), described in the aforementionedexample embodiment, a second internal contact plug 583 (in FIGS. 29B and30A) which may replace the second internal pad pattern 34 b (in FIGS. 2Band 6A) and the second internal contact plug 83 (in FIGS. 2A and 6A),described in the aforementioned example embodiment, and an externalcontact plug 587 (in FIGS. 29B and 30B) which may replace the externalpad pattern 34 c (in FIGS. 2B and 6B) and the external contact plug 87(in FIGS. 2B and 6B). FIG. 29A is a cross-sectional diagram illustratinga region taken along line I-I′ in FIG. 1 . FIG. 28B is a cross-sectionaldiagram illustrating a region taken along line II-II′ in FIG. 1 . FIG.30A is an enlarged diagram illustrating portions of regions marked “B1a”in FIG. 29A and “B2a” in FIG. 29B. FIG. 30B is an enlarged diagramillustrating a portion of region marked “B4a” in FIG. 29B.

Referring to FIGS. 29A, 29B, 30A, and 30B, the pattern structure 514which may replace the pattern structure 14 (in FIGS. 2A and 2B)described in the aforementioned example embodiment may include the lowerpattern layer 16, the intermediate pattern layer 20, the upper patternlayer 22, and the sacrificial pattern layer 18, similarly to the patternstructure 14 (in FIGS. 2A and 2B). The pattern structure 514 may furtherinclude a pattern protrusion portion 514 v extending from the lowerpattern layer 16 up to an upper portion of a lower pad 8 p 4″ of thelower wiring structure 8 and spaced apart from the lower pad 8 p 4″. Thelower pattern layer 16 and the pattern protrusion portion 514 v may beintegrated with each other.

The source contact plug 585 (in FIG. 29B) which may replace the sourcecontact plug 85 (in FIGS. 2B and 6B) described in the aforementionedexample embodiment may be directly in contact with the pattern structure514. For example, the source contact plug 585 (in FIG. 29B) may bedirectly in contact with the upper pattern layer 22.

The pattern structure 514 may further include a lower barrier layer 15which may conformally cover lower portions of the lower pattern layer 16and the pattern protrusion portion 514 v. The lower barrier layer 15 maybe in contact with the pattern protrusion portion 514 v and the lowerpad 8 p 4″. The pattern protrusion portion 514 v may be grounded to aground region 5 of the substrate 4 through the pattern protrusionportion 514V and the lower barrier layer 15. The lower pad 8 p 4″ mayinclude a metal such as tungsten, and the lower barrier layer 15 mayinclude metal nitride such as TiN.

The first internal contact plug 581 (in FIGS. 29A and 30A) which mayreplace the first internal pad pattern 34 a (in FIGS. 2A and 6A) and thefirst internal contact plug 81 (in FIGS. 2A and 6A), described in theaforementioned example embodiment, may include a plug upper verticalportion 581U in the second upper structure 55, a plug lower verticalportion 581L in the first upper structure 39, a plug intermediateportion 581V disposed between the plug upper vertical portion 581U andthe plug lower vertical portion 581L, and a pad pattern portion 534 acontinuously extending from the plug lower vertical portion 581L. In thefirst internal contact plug 581 (in FIGS. 29A and 30A), the pad patternportion 534 a may include a pad portion 534 p 1 penetrating the firstintermediate insulating layer 26 a and having a thickness the same as athickness of the pattern structure 514, and a via portion 534 v 1extending downwardly from the pad portion 534 p 1 and in contact withthe first lower pad 8 p 1. In the first internal contact plug 581 (inFIGS. 29A and 30A), the plug upper vertical portion 581U, the plug lowervertical portion 581L, the plug intermediate portion 581V, the padportion 534 p 1, and the via portion 534 v 1 may be integrated with oneanother. The configuration in which the elements may be integrated withone another may indicate that one of the material layers may becontinuously disposed without a boundary surface among the elements.

The second internal contact plug 583 (in FIGS. 29B and 30A) which mayreplace the second internal pad pattern 34 b (in FIGS. 2B and 6A) andthe second internal contact plug 83 (in FIGS. 2A and 6A), described inthe aforementioned example embodiment, may include a plug upper verticalportion 583U in the second upper structure 55, a plug lower verticalportion 583L in the first upper structure 39, a plug intermediateportion 583V disposed between the plug upper vertical portion 583U andthe plug lower vertical portion 583L, and a pad pattern portion 534 bcontinuously extending from the plug lower vertical portion 583L. In thesecond internal contact plug 583 (in FIGS. 29B and 30A), the pad patternportion 534 b may include a pad portion 534 p 2 penetrating the secondintermediate insulating layer 26 b and having a thickness the same as athickness of the pattern structure 514, and a via portion 534 v 2continuously extending downwardly from the pad portion 534 p 2 without aboundary surface and in contact with the second lower pad 8 p 2. In thesecond internal contact plug 583 (in FIGS. 29B and 30A), the plug uppervertical portion 583U, the plug lower vertical portion 583L, the plugintermediate portion 583V, the pad portion 534 p 2, and the via portion534 v 2 may be integrated with one another.

The external contact plug 587 (in FIGS. 29B and 30B) which may replacethe external pad pattern 34 c (in FIGS. 2B and 6B) and the externalcontact plug 87 (in FIGS. 2B and 6B) may include a plug upper verticalportion 587U in the second upper structure 55, a plug lower verticalportion 587L in the first upper structure 39, a plug intermediateportion 587V disposed between the plug upper vertical portion 587U andthe plug lower vertical portion 587L, and a pad pattern portion 534 ccontinuously extending downwardly from the plug lower vertical portion587L. In the external contact plug 587 (in FIGS. 29B and 30B), the padpattern portion 534 c may include a pad portion 534 p 3 penetrating theexternal intermediate insulating layer 26 c and having a thickness thesame as a thickness of the pattern structure 514, and a via portion 534v 3 continuously extending downwardly from the pad portion 534 p 3without a boundary surface and in contact with the third lower pad 8 p3. In the external contact plug 587 (in FIGS. 29B and 30B), the plugupper vertical portion 587U, the plug lower vertical portion 587L, theplug intermediate portion 587V, the pad portion 534 p 3, and the viaportion 534 v 3 may be integrated with one another.

Each of the first internal contact plug 581 (in FIGS. 29A and 30A), thesecond internal contact plug 583 (in FIGS. 29B and 30A), and theexternal contact plug 587 (in FIGS. 29B and 30B) may include a contactgap-fill layer 580 b and a contact barrier layer 580 a covering a bottomsurface and a lateral surface of the contact gap-fill layer 580 b. Thecontact barrier layer 580 a may include metal nitride such as TiN, andthe contact gap-fill layer 580 b may include a metal such as W, or thelike.

In the description below, a pad portion 534 p 1′ which may replace thepad portion 534 p 1 of the first internal contact plug 581 (in FIGS. 29Aand 30A) described in the aforementioned example embodiment, and a padportion 534 p 3′ which may replace the pad portion 534 p 3 of theexternal contact plug 587 (in FIGS. 29B and 30B) will be described withreference to FIG. 31 . FIG. 31 is an enlarged diagram illustratingportions of modified examples of regions marked “B1a” in FIG. 29A and“B4a” in FIG. 29B.

Referring to FIG. 31 , each of the pad portion 534 p 1′, which mayreplace the pad portion 534 p 1 (in FIG. 30A) of the first internalcontact plug 581 described in the aforementioned example embodiment, andthe pad portion 534 p 3′, which may replace the pad portion 534 p 3 (inFIG. 30B) of the external contact plug 587, may include a recessedlateral surface portion, and a pad sacrificial pattern 518 filling therecessed lateral surface portion of the pad portions 534 p 1′ and 534 p3′ may be disposed. A central portion of an upper surface of the padportion 534 p 3′ of the external contact plug 587 may be recessed.

The pad sacrificial pattern 518 may be formed of a thickness and amaterial the same as those of the pad sacrificial pattern 18 (in FIG.6B) described in the aforementioned example embodiment. Accordingly, thepad sacrificial pattern 518 may include the first layer 18 a, the secondlayer 18 b, and the third layer 18 c stacked in order.

In the description below, a pattern structure 614 which may replace thepattern structure 514 (in FIGS. 29A and 29B) will be described withreference to FIG. 32 . FIG. 32 is a cross-sectional diagram illustratinga region taken along line II-II′ in FIG. 1 .

Referring to FIG. 32 , the pattern structure 614 which may replace thepattern structure 514 (in FIGS. 29A and 29B) may include the lowerpattern layer 16, the intermediate pattern layer 20, the upper patternlayer 22, and the sacrificial pattern layer 18, similarly to the patternstructure 14 (in FIGS. 2A and 2B). The pattern structure 614 may furtherinclude a pattern protrusion 614 v which may extend from the lowerpattern layer 16 to an upper portion of a lower pad 8 p 4″ of the lowerwiring structure 8 and spaced apart from the lower pad 8 p 4″.

The region of the lower pad 8 p 4″ in contact with the patternprotrusion 614 v may be configured as a nitrified region 609 which hasbeen nitrified. For example, when the lower pad 8 p 4″ is formed of afirst metal, a partial region of the lower pad 8 p 4″ in contact withthe pattern protrusion 614 v may be configured as the nitrified region609 formed of the first metal. For example, when the lower pad 8 p 4″includes tungsten, the nitrified region 609 may be formed of tungstennitride.

In the description below, an example of a method of manufacturing asemiconductor device will be described with reference to FIGS. 33A to39B. In FIGS. 33A to 39B, FIGS. 33 a, 34 a, 35 a, 36 a , 37, 38 a, and39 a are cross-sectional diagrams illustrating a region along line I-I′in FIG. 1 , and FIGS. 33 b, 34 b, 35 b, 36 b, 38 b, and 39 b arecross-sectional diagrams illustrating a region along line II-II′ in FIG.1 .

Referring to FIGS. 1, 33A, and 33B, a lower structure 2 may be formed.The forming the lower structure 2 may include forming a lowerintegration circuit 6, a lower wiring structure 8, and a lowerinsulating structure 12 on a substrate 4.

The lower integration circuit 6 may be configured as a semiconductorsubstrate such as single crystalline silicon. The lower integrationcircuit 6 may be a circuit for operating a memory cell array of a memorydevice such as a flash memory or a variable resistive memory. The lowerwiring structure 8 may include first to fourth lower pads 8 p 1, 8 p 2,8 p 3, and 8 p 4. The lower insulating structure 12 may include a firstlower insulating layer 12 a covering the lower integration circuit 6 andthe lower wiring structure 8, an etch stop layer 12 b on the first lowerinsulating layer 12 a, and a second lower insulating layer 12 c on theetch stop layer 12 b.

A pattern structure 14 having a first internal opening 14 a and a secondinternal opening 14 b, and a dummy pattern 14 d may be formed on thelower structure 2.

The forming the pattern structure 14 and the dummy pattern 14 d may besimultaneously formed by forming the lower pattern layer 16 on the lowerstructure 2, forming a sacrificial pattern layer 18 on the lower patternlayer 16, forming an upper pattern layer 22 in contact with the lowerpattern layer 16 on the sacrificial pattern layer 18 through the opening19, and patterning the lower pattern layer 16, the sacrificial patternlayer 18, and the upper pattern layer 22.

The dummy pattern 14 d may include the lower pattern layer 16, thesacrificial pattern layer 18, and the upper pattern layer 22 stacked inorder.

The pattern structure 14 may include the lower pattern layer 16, thesacrificial pattern layer 18 having the opening 19 on the lower patternlayer 16, and the upper pattern layer 22 covering the sacrificialpattern layer 18 and in contact with the lower pattern layer 16 throughthe opening 19.

The lower pattern layer 16 may be formed of polysilicon having N-typeconductivity, for example.

In an example embodiment, the sacrificial pattern layer 18 may include afirst layer 18 a, a second layer 18 b, and a third layer 18 c. The firstand third layers 18 a and 18 c may be formed of silicon oxide, and thesecond layer 18 b may be formed of silicon nitride.

The upper pattern layer 22 may be formed of polysilicon having N-typeconductivity, for example.

Thereafter, an insulating layer may be formed, and the insulating layermay be planarized until upper surfaces of the pattern structure 14 andthe dummy pattern 14 d are exposed, thereby forming an intermediateinsulating structure 26.

The intermediate insulating structure 26 may include a firstintermediate insulating layer 26 a remaining in the first internalopening 14 a, a second intermediate insulating layer 26 b remaining inthe second internal opening 14 b, and an external intermediateinsulating layer 26 c surrounding an external surface of the patternstructure 14 and a lateral surface of the dummy pattern 14 d.

In an example embodiment, a contact pattern 30 and pad patterns 34 maybe formed simultaneously.

In another example embodiment, a sacrificial metal pattern 32 may beformed together while the contact pattern 30 and the pad patterns 34 areformed.

The forming the contact pattern 30, the sacrificial metal pattern 32,and the pad patterns 34 may include forming openings 28 a, 28 b, 29 a,29 b, and 29 c, forming a metal-semiconductor compound layer 35 by asilicide process, and performing a deposition process and aplanarization process, thereby forming a contact barrier layer and acontact gap-fill layer remaining in the openings 28 a, 28 b, 29 a, 29 b,and 29 c. The contact barrier layer may cover a lateral surface and abottom surface of the contact gap-fill layer.

The openings 28 a, 28 b, 29 a, 29 b, and 29 c may include a sourcecontact opening 28 a, a sacrificial pattern opening 28 b, a firstinternal pad opening 29 a, a second internal pad opening 29 b, and anexternal pad opening 29 c. The first internal pad opening 29 a maypenetrate the first intermediate insulating layer 26 a and maydownwardly extend to expose the first lower pad 8 p 1, the secondinternal pad opening 29 b may penetrate the second intermediateinsulating layer 26 b and may extend downwardly to exposed the secondlower pad 8 p 2, and the external pad opening 29 c may penetrate theexternal intermediate insulating layer 26 c and may extend downwardly toexpose the third lower pad 8 p 3. The source contact opening 28 a mayexpose a portion of the pattern structure 14 and may extend downwardlyin the external intermediate insulating layer 26 c to expose the fourthlower pad 8 p 4, and the sacrificial pattern opening 28 b may expose aportion of the pattern structure 14.

The contact pattern 30 may be formed in the source contact opening 28 a,and the sacrificial metal pattern 32 may be formed in the sacrificialpattern opening 28 b.

The pad patterns 34 may include a first internal pad pattern 34 a formedin the first internal pad opening 29 a, a second internal pad pattern 34b formed in the second internal pad opening 29 b, and an external padpattern 34 c formed in the external pad opening 29 c.

Each of the pad patterns 34, the contact pattern 30, and the sacrificialmetal pattern 32 may include a contact barrier layer and a contactgap-fill layer in common.

In an example embodiment, the contact pattern 30 and the sacrificialmetal pattern 32 may further include the metal-semiconductor compoundlayer 35 interposed between the contact barrier layer and the lowerpattern layer 16 of the pattern structure 14 and between the contactbarrier layer and the upper pattern layer 22 of the pattern structure14.

The sacrificial metal pattern 32 may be used to form lower portions ofthe separation structures 377 (in FIG. 22 ) as described in theaforementioned example embodiment with reference to FIG. 22 . In anotherexample embodiment, the forming the sacrificial metal pattern 32 may notbe performed. For example, to form lower portions of the separationstructures 77 (in FIG. 2A) as described in the aforementioned exampleembodiment with reference to FIG. 2A, the sacrificial metal pattern 32may not be provided. In the description below, an example in which thesacrificial metal pattern 32 is formed will be described.

Referring to FIGS. 1, 34A, and 34B, a first preliminary upper structure38 may be formed on a structure including the pad patterns 34, thecontact pattern 30, and the sacrificial metal pattern 32 formed therein.

The forming the first preliminary upper structure 38 may include forminga first preliminary stack structure 40 and forming a first cappinginsulating layer 47 covering the first preliminary stack structure 40.The first capping insulating layer 47 may have a planar upper surface.

The forming the first preliminary stack structure 40 may include forminglower interlayer insulating layers 42 and first mold layers 44alternately stacked, and patterning the lower interlayer insulatinglayers 42 and the first mold layers 44 to form a staircase structure.

Lower sacrificial patterns 50 a to 50 f penetrating the firstpreliminary upper structure 38 may be formed.

The lower sacrificial patterns 50 a to 50 f may include a channel lowersacrificial pattern 50 a, a separation lower sacrificial pattern 50 b, afirst contact lower sacrificial pattern 50 c, a second contact lowersacrificial pattern 50 d, a third contact lower sacrificial pattern 50e, and an external contact lower sacrificial pattern 50 f.

The channel lower sacrificial pattern 50 a may penetrate the firstpreliminary upper structure 38 and may extend into the lower patternlayer 16 of the pattern structure 14.

The separation lower sacrificial pattern 50 b may penetrate the firstpreliminary upper structure 38 and may be in contact with thesacrificial metal pattern 32.

The first contact lower sacrificial pattern 50 c may penetrate the firstpreliminary upper structure 38 and may be in contact with the firstinternal pad pattern 34 a, the second contact lower sacrificial pattern50 d may penetrate the first preliminary upper structure 38 and may bein contact with the second internal pad pattern 34 b, the third contactlower sacrificial pattern 50 e may penetrate the first preliminary upperstructure 38 and may be in contact with the contact pattern 30, and thefourth contact lower sacrificial pattern 50 e may penetrate the firstpreliminary upper structure 38 and may be in contact with the externalpad pattern 34 c.

Referring to FIGS. 1, 35A, and 35B, a second preliminary upper structure54 may be formed on the lower sacrificial patterns 50 a to 50 f and thefirst preliminary upper structure 38.

The forming the second preliminary upper structure 54 may includeforming a second preliminary stack structure 56 and forming a secondcapping insulating layer 63 covering the second preliminary stackstructure 56. The second capping insulating layer 63 may have a planarupper surface.

The forming the second preliminary stack structure 56 may includeforming the upper interlayer insulating layers 59 and second mold layers60 alternately stacked and patterning the upper interlayer insulatinglayers 59 and second mold layers 60 to form a staircase structure.

Upper sacrificial patterns 65 a to 65 f penetrating the secondpreliminary upper structure 54 may be formed.

The upper sacrificial patterns 65 a to 65 f may include a channel uppersacrificial pattern 65 a, a separation upper sacrificial pattern 65 b, afirst contact upper sacrificial pattern 65 c, a second contact uppersacrificial pattern 65 d, a third contact upper sacrificial pattern 65e, and an external contact upper sacrificial pattern 65 f.

The upper sacrificial patterns 65 a to 65 f may be vertically aligned tocorrespond to the lower sacrificial patterns 50 a to 50 f, respectively.

Referring to FIGS. 1, 36A, and 36B, a hole may be formed by selectivelyremoving the channel lower sacrificial pattern 50 a and the channelupper sacrificial pattern 65 a stacked or aligned in order, and a memoryvertical structure 67 may be formed in the hole.

In an example embodiment, the memory vertical structure 67 may include achannel layer which may be formed of a semiconductor material and a datastorage layer which may store data.

Referring to FIGS. 1 and 37 , a separation trench 76 may be formed byselectively removing the separation lower sacrificial pattern 50 b andthe separation upper sacrificial pattern 65 b stacked or aligned inorder and removing the sacrificial metal pattern 32.

By the separation trench 76, a portion of the sacrificial pattern layer18 of the pattern structure 14 may be exposed.

Referring to FIGS. 1, 38A, and 38B, a lower empty space may be formed byetching the sacrificial pattern layer 18 of the pattern structure 14exposed by the separation trench 76, and the intermediate pattern layer20 which may fill the lower empty space may be formed. Accordingly, thepattern structure 14 may include the intermediate pattern layer 20. Theintermediate pattern layer 20 may be formed of polysilicon having N-typeconductivity, for example.

In an example embodiment, a portion of the sacrificial pattern layer 18of the pattern structure 14 may remain. For example, an end portion ofthe sacrificial pattern layer 18 of the pattern structure 14 which doesnot overlap the first and second mold layers 44 and 60 may remain.

Gate empty spaces and mold layers 44 a, 44 b, and 60 a which may remainmay be formed by partially etching the first and second mold layers 44and 60 exposed by the separation trench 76, and lower and upper gatelayers 45 and 61 filling the gate empty spaces may be formed. The lowergate layers 45 may be formed in empty spaces formed by etching the firstmold layers 44, and the upper gate layers 61 may be formed in emptyspaces formed by etching the second mold layers 60. The mold layers 44a, 44 b, and 60 a which may remain may be configured as the first andsecond lower mold layers 44 a and 44 b and the upper mold layers 60 adescribed with reference to FIGS. 2A and 2B.

In an example embodiment, the first and second mold layers 44 and 60 mayremain in a region overlapping the first internal opening 14 a and aregion overlapping the second internal opening 14 b.

The first preliminary stack structure 40 may be formed as a first stackstructure 41 including the lower gate layers 45, and the secondpreliminary stack structure 56 may be formed as a second stack structure57 including the upper gate layers 61.

The first preliminary upper structure 38 may be formed as a first upperstructure 39 including the first stack structure 41, and the secondpreliminary upper structure 54 may be formed as a second upper stackstructure 55 including the second stack structure 57.

Referring to FIGS. 1, 39A, and 39B, a separation structure 77 fillingthe separation trench 76 may be formed. In an example embodiment, theseparation structure 77 may be formed of an insulating material. Inanother example embodiment, the separation structure 77 may be formed asa conductive material layer and an insulating spacer surrounding alateral surface of the conductive material layer.

Contact holes may be formed by simultaneously removing the first contactlower sacrificial pattern 50 c and the first contact upper sacrificialpattern 65 c stacked or aligned in order, the second contact lowersacrificial pattern 50 d and the second contact upper sacrificialpattern 65 d stacked or aligned in order, the third contact lowersacrificial pattern 50 e and the third contact upper sacrificial pattern65 e stacked or aligned in order, and the external contact lowersacrificial pattern 50 f and the external contact upper sacrificialpattern 65 f stacked or aligned in order, and the contact holes may befilled with a conductive material, thereby forming contact plugs 81, 83,85, and 87.

The contact plugs 81, 83, 85, and 87 may include a first internalcontact plug 81 disposed in a contact hole formed by removing the firstcontact lower sacrificial pattern 50 c and the first contact uppersacrificial pattern 65 c stacked or aligned in order, a second internalcontact plug 83 disposed in a contact hole formed by removing the secondcontact lower sacrificial pattern 50 d and the second contact uppersacrificial pattern 65 d stacked or aligned in order, a source contactplug 85 disposed in a contact hole formed by removing the third contactlower sacrificial pattern 50 e and the third contact upper sacrificialpattern 65 e stacked or aligned in order, and a external contact plug 87disposed in a contact hole formed by removing the external contact lowersacrificial pattern 50 f and the external contact upper sacrificialpattern 65 f stacked or aligned in order.

A first upper insulating layer 103 may be formed on the second upperstack structure 55 and the contact plugs 81, 83, 85, and 87.

Gate contact holes for exposing pad regions of the lower and upper gatelayers 45 and 61 may be formed by patterning the first upper insulatinglayer 103 and the first and second capping insulating layers 47 and 63,and gate contact plugs 91 may be formed in the gate contact holes.

A second upper insulating layer 105 may be formed on the first upperinsulating layer 103. Thereafter, the first to sixth lower connectionplugs 111 a to 111 f described with reference to FIGS. 2A and 2B may beformed.

Referring back to FIGS. 1, 2A, and 2B, a third upper insulating layer107 may be formed on the second upper insulating layer 105. Thereafter,the first to sixth upper connection plugs 113 a to 113 f described withreference to FIGS. 2A and 2B may be formed on the first to sixth lowerconnection plugs 111 a to 111 f. The bit lines 115 a, the gateconnection wirings 115 b, the source connection wiring 115 d, and theexternal connection wiring 115 c, described with reference to FIGS. 2Aand 2B, may be formed on the first to sixth upper connection plugs 113 ato 113 f.

In the description below, another example embodiment of a method ofmanufacturing a semiconductor device will be described with reference toFIGS. 40A to 41B. In FIGS. 40A to 41B, FIGS. 40A and 41A arecross-sectional diagrams illustrating a region along line I-I′ in FIG. 1, and FIGS. 41A and 41B are cross-sectional diagrams illustrating aregion along line II-II′ in FIG. 1 . In the description below, the otherexample embodiment of a method of manufacturing a semiconductor devicewill be described briefly by referring to the method described withreference to FIGS. 33A to 39B.

Referring to FIGS. 1, 40A, and 40B, the lower structure 2, the patternstructure 14, the dummy pattern 14 d, the intermediate insulatingstructures 26 a, 26 b, and 26 c, and the pad patterns 34 described withreference to FIGS. 33A and 33B may be formed. The sacrificial metalpattern 32 described in FIG. 33A may be formed or may not be provided.In the description below, an example in which the sacrificial metalpattern 32 is not provided will be described.

The first preliminary upper structure 38 (in FIGS. 34A and 34B) as inFIGS. 34A and 34B may be formed, and the channel lower sacrificialpattern 50 a (in FIGS. 34A and 34B), the first contact lower sacrificialpattern 50 c, the second contact lower sacrificial pattern 50 d, thethird contact lower sacrificial pattern 50 e, and the external contactlower sacrificial pattern 50 f may be formed.

In an example embodiment, to form the separation structures 277 asillustrated in FIG. 20 , the separation lower sacrificial pattern 50 b(in FIGS. 34A and 34B) as in FIGS. 34A and 34B may be formed.

In another example embodiment, to form the separation structures 177 (inFIG. 19A) as in FIG. 19A, the forming the separation lower sacrificialpattern 50 b (in FIGS. 34A and 34B) described with reference to FIGS.34A and 34B may not be performed. In the description below, an exampleembodiment in which the forming the separation lower sacrificial pattern50 b (in FIGS. 34A and 34B) described with reference to FIGS. 34A and34B is not performed will be described.

In an example embodiment, the second preliminary upper structure 54 (inFIGS. 35A and 35B) illustrated in FIGS. 35A and 35B may be formed, andthe channel upper sacrificial pattern 65 a (in FIGS. 35A and 35B) may beformed. In this case, the forming the separation upper sacrificialpattern 65 b (in FIGS. 35A and 35B), the first contact upper sacrificialpattern 65 c (in FIGS. 35A and 35B), the second contact uppersacrificial pattern 65 d (in FIGS. 35A and 35B), the third contact uppersacrificial pattern 65 e (in FIGS. 35A and 35B), and the externalcontact upper sacrificial pattern 65 f (in FIGS. 35A and 35B), asdescribed with reference to FIGS. 35A and 35B, may not be performed.

A first upper insulating layer 203 may be formed on the secondpreliminary upper structure 54 (in FIGS. 35A and 35B).

Separation trenches 176 penetrating the first upper insulating layer 203and the second preliminary upper structure 54 (in FIGS. 35A and 35B) maybe formed. The separation trenches 176 may expose the sacrificialpattern layer 18 (in FIG. 37 ), substantially similarly to theseparation trenches 77 (in FIG. 37 ) described with reference to FIG. 37. Thereafter, the sacrificial pattern layer 18 (in FIG. 37 ) may bereplaced with an intermediate pattern layer 20 by the same methoddescribed with reference to FIGS. 38A and 38B.

The gate empty spaces, and the first and second mold layers 44 a, 44 b,and 60 a which may remain, described with reference to FIGS. 38A and38B, may be formed by partially etching the first and second mold layers44 and 60 (in FIG. 37 ) exposed by the separation trenches 176 by thesame method described with reference to FIGS. 38A and 38B, and the lowerand upper gate layers 45 and 61 may be formed in the gate empty spaces.Accordingly, the first upper structure 39 and the second upper stackstructure 55 as in FIGS. 19A and 19B may be formed.

Separation structures 177 may be formed in the separation trenches 176.The separation structures 177 may be the same as in FIG. 19A.

Referring to FIGS. 1, 41A, and 41B, a second upper insulating layer 205may be formed on the first upper insulating layer 203.

In an example embodiment, a first contact upper contact hole 265 apenetrating the first and second upper insulating layers 203 and 205,extending downwardly, and exposing the first contact lower sacrificialpattern 50 c, a second contact upper contact hole 265 c exposing thesecond contact lower sacrificial pattern 50 d, a third contact uppercontact hole 265 d exposing the third contact lower sacrificial pattern50 e, and an external upper contact hole 265 e exposing the externalcontact lower sacrificial pattern 50 f may be formed.

In an example embodiment, while the first to third contact upper contactholes 265 a, 265 c, and 265 d and the external upper contact hole 265 eare formed, gate contact holes 265 b simultaneously exposing pad regionsof the lower and upper gate layers 45 and 61 may be formed.

In another example embodiment, the forming the gate contact holes 265 bmay include forming gate contact holes exposing pad regions of at leastsome of the lower gate layers 45, forming the first to third contactupper contact holes 265 a, 265 c, and 265 d and the external uppercontact hole 265 e, and forming gate contact holes exposing pad regionsof the remaining upper and lower gate layers 45 and 61.

Thereafter, the first to third contact lower sacrificial patterns 50 c,50 d, and 50 e and the external contact lower sacrificial pattern 50 fexposed by the first to third contact upper contact holes 265 a, 265 c,and 265 d and the external upper contact hole 265 e may be removed.Thereafter, processes of depositing and planarizing a conductivematerial layer may be performed, thereby forming the first and secondinternal contact plugs 181 and 183 (in FIGS. 19A and 19B), the sourcecontact plug 185 (in FIG. 19B), and the external contact plug 187 (inFIG. 19B), described with reference to FIGS. 19A and 19B.

According to the aforementioned example embodiments, at least two of theseparation structures 77, the memory vertical structure 67, the firstinternal contact plug 81, the second internal contact plug 83, thesource contact plug 85, and the external contact plug 87 may have alateral surface having at least one bent portion. Accordingly, processesfor forming the at least two of the separation structures 77, the memoryvertical structure 67, the first internal contact plug 81, the secondinternal contact plug 83, the source contact plug 85, and the externalcontact plug 87 may be merged. Accordingly, productivity of thesemiconductor device may improve.

According to the aforementioned example embodiments, as at least two ofthe separation structures 77, the memory vertical structure 67, thefirst internal contact plug 81, the second internal contact plug 83, thesource contact plug 85, and the external contact plug 87 include alateral surface having at least one bent portion, the at least twoelements may be formed on a higher level and a defect may decrease.Accordingly, integration density of the semiconductor device mayincrease, and reliability of the semiconductor device may improve.

According to the aforementioned example embodiments, the first internalcontact plug 81, the second internal contact plug 83, the source contactplug 85, and the external contact plug 87 may be disposed on a metallicpattern (e.g., the contact pattern 30 and the pad patterns 34) disposedon a level the same as a level of at least a portion of the patternstructure including polysilicon. By providing the metallic pattern, thecontact pattern 30 and the pad patterns 34, the first internal contactplug 81, the second internal contact plug 83, the source contact plug85, and the external contact plug 87 may be stably formed. Accordingly,integration density of the semiconductor device may increase, andreliability of the semiconductor device may improve.

As is traditional in the field, embodiments may be described andillustrated in terms of blocks which carry out a described function orfunctions. These blocks, which may be referred to herein as units ormodules or the like, are physically implemented by analog and/or digitalcircuits such as logic gates, integrated circuits, microprocessors,microcontrollers, memory circuits, passive electronic components, activeelectronic components, optical components, hardwired circuits and thelike, and may optionally be driven by firmware and/or software. Thecircuits may, for example, be embodied in one or more semiconductorchips, or on substrate supports such as printed circuit boards and thelike. The circuits constituting a block may be implemented by dedicatedhardware, or by a processor (e.g., one or more programmedmicroprocessors and associated circuitry), or by a combination ofdedicated hardware to perform some functions of the block and aprocessor to perform other functions of the block. Each block of theembodiments may be physically separated into two or more interacting anddiscrete blocks without departing from the scope of the disclosure.Likewise, the blocks of the embodiments may be physically combined intomore complex blocks without departing from the scope of the disclosure.An aspect of an embodiment may be achieved through instructions storedwithin a non-transitory storage medium and executed by a processor.

While the example embodiments have been shown and described above, itwill be apparent to those skilled in the art that modifications andvariations could be made without departing from the scope of the presentdisclosure as defined by the appended claims.

What is claimed is:
 1. A semiconductor device comprising: a lowerstructure including a lower pad; a pattern structure and an intermediateinsulating layer on the lower structure; a first upper structure on thepattern structure and including first gate layers spaced apart from eachother in a vertical direction; a second upper structure on the firstupper structure and including second gate layers spaced apart from eachother in the vertical direction; a memory vertical structure penetratingthe first and second gate layers; and a contact plug penetrating thefirst and second upper structures, wherein the intermediate insulatinglayer is at a same level as the pattern structure, wherein the contactplug includes: a first portion contacting the lower pad; a secondportion extending continuously from the first portion; a third portionextending continuously from the second portion; and a fourth portionextending continuously from the third portion, wherein at least aportion of the second portion is at a same level as the patternstructure and penetrates the intermediate insulating layer, wherein atleast a portion of the third portion is at a same level as at least aportion of the first upper structure, wherein at least a portion of thefourth portion is at a same level as the second upper structure, andwherein a lateral surface of the contact plug includes: a first bentportion between a lateral surface of the first portion and a lateralsurface of the second portion; and a second bent portion between thelateral surface of the second portion and a lateral surface of the thirdportion.
 2. The semiconductor device of claim 1, wherein the secondportion of the contact plug includes: a lower portion; an intermediateportion on the lower portion; and an upper portion on the intermediateportion, wherein a width of the intermediate portion is smaller than awidth of each of the lower portion and the upper portion.
 3. Thesemiconductor device of claim 2, wherein a thickness of the lowerportion is greater than a thickness of each of the intermediate portionand the upper portion.
 4. The semiconductor device of claim 2, furthercomprising: a dummy pattern on a side surface of the intermediateportion and between the lower portion and the upper portion.
 5. Thesemiconductor device of claim 4, wherein at least a portion of the dummypattern includes silicon oxide or silicon nitride.
 6. The semiconductordevice of claim 2, wherein the pattern structure includes: a firstlayer; a second layer on the first layer; and a third layer on thesecond layer, wherein at least one of the first, second and third layersincludes polysilicon, wherein at least a portion of the lower portion isat a same level as at least a portion of the first layer, wherein atleast a portion of the intermediate portion is at a same level as atleast a portion of the second layer, and wherein at least a portion ofthe upper portion is at a same level as at least a portion of the thirdlayer.
 7. The semiconductor device of claim 1, wherein the lateralsurface of the contact plug further includes a third bent portionbetween the lateral surface of the third portion and a lateral surfaceof the fourth portion, and wherein at least a portion of the third bentportion is at a higher level than an uppermost first gate layer amongthe first gate layers, and is at a lower level than a lowermost secondgate layer among the second gate layers.
 8. The semiconductor device ofclaim 6, wherein a distance between the uppermost first gate layer andthe lowermost second gate layer is greater than a distance between thefirst gate layers adjacent to each other in the vertical direction. 9.The semiconductor device of claim 1, wherein the first upper structurefurther includes first mold layers, wherein the second upper structurefurther includes second mold layers, wherein the first mold layers areat a same level as at least a portion of the first gate layers, whereinthe second mold layers are at a same level as at least a portion of thesecond gate layers, wherein the third portion penetrating the first moldlayers, and wherein the fourth portion penetrating the second moldlayers.
 10. The semiconductor device of claim 1, wherein the memoryvertical structure includes: a core region; a channel layer on at leasta side surface of the core region; and a data storage structure betweenthe channel layer and the first gate layers and between the channellayer and the second gate layers, wherein the pattern structure includesa polysilicon layer contacting the channel layer.
 11. The semiconductordevice of claim 1, wherein the pattern structure includes: a firstlayer; a second layer on the first layer; and a third layer on thesecond layer, wherein at least one of the first, second and third layersincludes polysilicon, wherein the first bent portion of the lateralsurface of the contact plug is at a lower level than a lower surface ofthe second layer, and wherein the second bent portion of the lateralsurface of the contact plug is at a higher level than an upper surfaceof the second layer.
 12. The semiconductor device of claim 11, whereinat least a portion of the first bent portion is at a same level as alower surface of the first layer.
 13. The semiconductor device of claim11, wherein at least a portion of the second bent portion is at a samelevel as an upper surface of the second layer.
 14. The semiconductordevice of claim 1, wherein the contact plug is a gap-fill layer and abarrier layer covering a side surface and a bottom surface of thegap-fill layer, wherein a lower end of the gap-fill layer is at a lowerlevel than the pattern structure, and wherein an upper end of thegap-fill layer is at a higher level than an uppermost second gate layeramong the second gate layers.
 15. A semiconductor device comprising: alower structure including a first lower pad and a second lower pad; apattern structure and an intermediate insulating layer on the lowerstructure; a first upper structure on the pattern structure andincluding first gate layers spaced apart from each other in a verticaldirection; a second upper structure on the first upper structure andincluding second gate layers spaced apart from each other in thevertical direction; a memory vertical structure penetrating the firstand second gate layers; a contact pattern contacting the patternstructure; a pad pattern including a pad portion in the intermediateinsulating layer, and a via portion extending downwardly from the padportion and electrically connected to the first lower pad; and a firstcontact plug on and contacting the pad portion, wherein at least aportion of the intermediate insulating layer is at a same level as atleast a portion of the pattern structure, wherein the contact patternand the pad pattern have upper surfaces coplanar with each other,wherein a lateral surface of the pad pattern includes a first bentportion between a lateral surface of the pad portion and a lateralsurface of the via portion, and wherein the pattern structure includes amaterial different from a material of the contact pattern.
 16. Thesemiconductor device of claim 15, further comprising: a second contactplug on and contacting the contact pattern, wherein the patternstructure includes: a first layer; a second layer on the first layer;and a third layer on the second layer, wherein at least one of thefirst, second and third layers includes polysilicon, wherein the contactpattern contacts the first layer, and wherein the first bent portion ofthe lateral surface of the pad pattern is at a lower level than an uppersurface of the first layer.
 17. The semiconductor device of claim 16,wherein a lower end of the contact pattern is at a lower level than theupper surface of the first layer.
 18. The semiconductor device of claim15, wherein the pattern structure includes: a first layer; a secondlayer on a portion of the first layer; and a third layer covering thesecond layer and on the first layer, wherein at least one of the first,second and third layers includes polysilicon, wherein the contactpattern includes a first portion contacting the pattern structure, and asecond portion extending downwardly from the first portion andcontacting the second lower pad.
 19. The semiconductor device of claim18, wherein the contact pattern contacts the first layer and the thirdlayer and is spaced apart from the second layer.
 20. The semiconductordevice of claim 15, further comprising connection pattern on the firstcontact plug, wherein the first contact plug includes a first plug and asecond plug spaced apart from the first plug in a horizontal direction,wherein a lower surface of the first plug and a lower surface of thesecond plug contact the pad pattern, wherein an upper surface of thefirst plug and an upper surface of the second plug contact theconnection pattern, and wherein the horizontal direction isperpendicular to the vertical direction.